The Chromaline Corporation

Ikonics Corporation

Other

Alexander S Gybin

Toshifumi Komatsu

Kyle K Johnson

Lawrence C Vaniseghem

Lawrence C Van Iseghem

Jeremy W Peterson

Dylan E MacLean

Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.

Digital mold texturizing methods, materials, and substrates

Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink-jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.

Methods and materials used to make detailed cast objects are disclosed. The cast objects are formed in mold created from a photosensitive laminate. The mold is formed by selectively removing portions of the photosensitive laminate. The invention is particularly well suited to make thin molded articles, but can also be used to make thicker molded articles by using multiple photosensitive layers or laminates.

Polymer casting method and apparatus

The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.

Screen printing stencil composition with improved water resistance

Disclosed are photoresist compositions comprising a polymeric backbone and a quaternary heterocyclic pendant group, particularly usefull in the preparation of screen printing and sandblast etching photoresists. The pendant groups comprise furanyl substituted quaternary heterocyclic groups, as seen in the formula:

Photosensitive resin composition

An integral membrane can be formed in sheet-like photosensitive laminate structures. The process for forming the structure involves coating a first relatively thin photosensitive layer on a substrate or carrier film, then forming a second relatively thicker photosensitive layer (when compared to the first layer) on the first layer. The structure is exposed by directing appropriate actinic radiation against the substrate, film or carrier layer under controlled conditions such that only the first layer is substantially exposed to radiation resulting in polymerization or crosslinking and a substantial reduction in the solubility of the first layer. The relatively thinner less soluble layer then acts as a peelable integral release layer in the photosensitive structure. The thicker second layer can then be imagewise exposed to actinic radiation, and then used conventionally in imaging processes such as sandblasting.

Integral membrane layer formed from a photosensitive layer in an

A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.

Non-photosensitive aqueous blockout composition and blockout method for

A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification and can produce photosensitive polymers which are of similar photosensity whether prepared with a poly(vinyl alcohol) or poly(vinyl pyridine) backbone. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.

Photosensitive, photocurable, compositions contain a polymeric backbone which are basic in an aqueous environment having a pendant photosensitive group. The pendant groups are styryl-amine or nitrogen heterocyclic groups which contain an ethylenically unsaturated photocross-linking group. The pendant styryl-amine or nitrogen heterocyclic groups can cross-link two polymer chains by photo addition through ethylenically unsaturated groups in the styryl moiety forming a cyclobutane crosslinked site. The cross-linking is accomplished by irradiating the material with visible light or ultraviolet radiation of appropriate wave length, depending on the absorbitivity of the system. The photocurable polymer can be formulated into useful systems including in liquid resists, pre-coated film resists, etc. and can be used in both negative or positive imaging systems.

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Duluth, MN, United States of America

Alexander S Gybin