Seagate Technology Incorporated

Applied Materials, Inc.

Alexander Parkhomovsky

Robert Michael Pelstring

Daniel Dennis Dittmer

Norbert Steven Parsoneault

Troy Michael Herndon

Arulkumar P Shanmugasundram

Martin Jay Seamons

Robert Alan Nottingham

Alexander T Schwarm

Roger Allen Addy

Jeffry Arnold LeBlanc

Ilias Iliopoulos

Lev Mikhailovich Dvoskin

A fluid dynamic bearing having a hub, a sleeve, and a sealing arrangement comprising a first capillary seal substantially retaining a first fluid and a second capillary seal comprising a second fluid. The second capillary seal is located between the first capillary seal and an opening between the hub and the sleeve.

Dual seal for optimized performance

An electrode containing a dielectric layer on a surface of the electrode and an active zone containing a metal embedded below the surface of the electrode, wherein the electrode is configured to form a groove pattern on a workpiece by an electrochemical machining process is disclosed. The electrode is capable of manufacturing a workpiece such as a counter plate, a sleeve journal or a conical bearing containing a groove pattern for fluid dynamics bearing, the groove pattern having a pitch of less than 80 microns. The electrode could be made by a method including depositing a dielectric layer on a surface of a metal, depositing a photoresist layer on the dielectric layer, printing a groove pattern on the photoresist layer, etching or physico-chemically removing portions of the dielectric photoresist layers to form grooves in the dielectric layer; removing the photoresist layer; and filling the grooves with a metal to produce the electrode.

Electrode for electrochemical machining

An improved rotational motor, such as a spindle motor for a disc drive, is provided. The motor first comprises a hub having a shaft portion and a horizontal body portion. The motor also comprises a sleeve surrounding the shaft portion of the hub. A fine vertical gap is retained between the shaft and the inner diameter of the surrounding sleeve. In addition, a fine horizontal gap is provided between the upper hub portion and the top of the sleeve. The vertical gap is filled with a lubricating liquid, such as a clean oil. A capillary seal is provided in the vertical fluid gap at one end. Preferably, the capillary seal is disposed at an upper end of the shaft proximal to the horizontal gap. Novel air pumping grooves are machined along the horizontal fluid gap. When the hub is rotated, the air pumping grooves create a high pressure region in the vicinity of the capillary seal. This forms a high pressure barrier that reduces the number of oil molecules diffusing out of the capillary seal and, therefore, inhibits oil loss from the system.

High pressure barrier to oil loss by diffusion

A method of film deposition in a chemical vapor deposition (CVD) process includes (a) providing a model for CVD deposition of a film that defines a plurality of regions on a wafer and identifies one or more film properties for at least two regions of the wafer and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of the one or more film properties for the deposited film of step (b) for each of the at least two regions of the wafer and determining a film property; (d) calculating an updated deposition model based upon the film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control film properties other than film thickness.

Feedback control of plasma-enhanced chemical vapor deposition processes

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Santa Clara, CA, United States of America

Alexander Parkhomovsky