Asml Netherlands B.v.

Alexander Nikolov Zdravkov

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Niek Jacobus Johannes Roset

Eva Mondt

Jeroen Johannes Sophia Maria Mertens

Hernes Jacobs

Jozef Petrus Henricus Benschop

Sander Catharina Reinier Derks

Teunis Cornelis Van Den Dool

Gerardus Adrianus Antonius Maria Kusters

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Hrishikesh Patel

Frank B Sperling

Suzan Leonie Auer-Jongepier

Johannes Fransiscus Maria Velthuis

Eric Willem Felix Casimiri

Paulus Martinus Hubertus Vissers

Sumant Sukdew Ramanujan Oemrawsingh

Sander Van Opstal

Marcel Mathijs Theodore Dierichs

Wassim Zein Eddine

An apparatus comprising at least one sealing aperture () comprising a hollow part (), having an inner surface (), extending at an interface between different zones () of the apparatus; and a member () positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

Apparatus, a device and a device manufacturing method

A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method

An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which includes, in cross-section, a feature, and has an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.

Lithographic apparatus and a device manufacturing method

A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.

Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table

A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.

Lithographic apparatus and method

Growing community of inventors

Eindhoven, Netherlands

Alexander Nikolov Zdravkov