Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Alexander Matthijs Struycken

Vadim Yevgenyevich Banine

Vladimir Vitalevitch Ivanov

Harm-Jan Voorma

Josephus Jacobus Smits

Johannes Bernardus Ridder

Johannes Christiaan Leonardus Franken

Carolus Ida Maria Antonius Spee

Klaas Timmer

Lambertus Adrianus Van Den Wildenberg

Erik Roelof Loopstra

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Ruud Antonius Catharina Maria Beerens

Vladimir Mihailovitch Krivtsun

Vladimir Mikhailovich Krivtsun

Ivo Vanderhallen

Leon Joseph Marie Van Den Schoor

Bert Pieter Van Drieënhuizen

Sumant Sukdew Ramanujan Oemrawsingh

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Engelbertus Antonius Fransiscus Van Der Pasch

Jan Bernard Plechelmus Van Schoot

Theodorus Petrus Maria Cadee

Markus Franciscus Antonius Eurlings

Andrei Mikhailovich Yakunin

Andrey Alexandrovich Nikipelov

Erik Theodorus Maria Bijlaart

Edwin Johan Buis

Stig Bieling

Olav Waldemar Vladimir Frijns

Konstantin Nikolaevitch Koshelev

Michael Jozef Mathijs Renkens

Konstantin Nikolaevich Koshelev

Antonius Theodorus Wilhelmus Kempen

Arnoud Cornelis Wassink

Erik Petrus Buurman

Henricus Gerardus Tegenbosch

Richard Henricus Adrianus Van Lieshout

Paul Peter Anna Antonius Brom

Edgar Alberto Osorio Oliveros

Ramon Mark Hofstra

Jacob Kleijn

Lambertus Adrianus Wildenberg

Ruben Jan Kok

Martinus Cornells Maria Verhagen

Peter Frans Maria Muys

Marcus Petrus Scheepers

An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

Optical device and associated system

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Radiation source

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target () at a plasma formation location () and directing a continuous-wave excitation beam () at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

Method and apparatus for generating radiation

A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Radiation collector, radiation source and lithographic apparatus

A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

Optical element mount for lithographic apparatus

A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

Ex-situ removal of deposition on an optical element

A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.

Lithographic apparatus, device manufacturing method, and use of a radiation collector

A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.

Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device

A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.

Lithographic apparatus, measurement system, and device manufacturing method

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Eindhoven, Netherlands

Alexander Matthijs Struycken