Asml Netherlands B.v.

Alexander Marinus Arnoldus Huijberts

Han-Kwang Nienhuys

Paulus Albertus Maria Gasseling

Vadim Yevgenyevich Banine

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Andrei Mikhailovich Yakunin

Carlo Cornelis Maria Luijten

Luigi Scaccabarozzi

Marcel Johannus Elisabeth Hubertus Muitjens

Nicolaas Aldegonda Jan Maria Van Aerle

Christiaan Louis Valentin

Maarten Van Kampen

Arthur Winfried Eduardus Minnaert

Roger Wilhelmus Antonius Henricus Schmitz

Alain Louis Claude Leroux

Peter Gerardus Jonkers

Sven Pekelder

Dries Vaast Paul Hemschoote

Pedro Julian Rizo Diago

Joost De Hoogh

Johannes Franciscus Martinus Van Santvoort

Hans Joerg Mallmann

Kurstat Bal

Radu Donose

Robert Coenraad Wit

A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

Gas mixing for fast temperature control of a cooling hood

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Lithographic apparatus and method of manufacturing a device

A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.

Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient

A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.

Lithographic apparatus configured to suppress contamination from passing into the projection system and method

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Veghel, Netherlands

Alexander Marinus Arnoldus Huijberts