Asml Netherlands B.v.

Alexander Ludwig Klein

Evgenia Kurganova

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Jim Vincent Overkamp

Adrianus Johannes Maria Giesbers

Ties Wouter Van Der Woord

Marcus Adrianus Van De Kerkhof

Johan Hendrik Klootwijk

Sebastianus Adrianus Goorden

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem-Pieter Voorthuijzen

Johannes Christiaan Leonardus Franken

Albertus Victor Gerardus Mangnus

Dennis De Graaf

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Teis Johan Coenen

Alexey Olegovich Polyakov

Aleksandar Nikolov Zdravkov

Tamara Druzhinina

Alexey Sergeevich Kuznetsov

Hendrikus Jan Wondergem

Peter Simon Antonius Knapen

Edgar Alberto Osorio Oliveros

Mahdiar Valefi

Luc Roger Simonne Haspeslagh

Sander Baltussen

Guilherme Brondani Torri

Ionel Mugurel Ciobica

Bastiaan Maurice Van Den Broek

Halil Gökay Yeǧen

Sten Vollebregt

Nitesh Pandey

Marijke Scotuzzi

A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

High force low voltage piezoelectric micromirror actuator

Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.

Method and apparatus for forming a patterned layer of material

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.

Graphene pellicle lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Alexander Ludwig Klein