Sensirion Ag

Alexander Lochbaum

Matthias Streiff

Jürg Leuthold

Lukas Bürgi

Ulrich Bartsch

Marc Von Waldkirch

Martin Winger

Silvio Graf

Jens Hornung

Alexander Dorodnyy

Stefan Knobelspies

Ueli Schoen

Lukas BÜRGI

A gas generator comprises a compartment confined by a casing configured to hold an active material generating a target gas in response to thermal activation, and a heater structure configured and arranged to heat the active material for generating the target gas. The heater structure is arranged outside the compartment and heats the active material from at least two sides.

Gas generator

A photodetector comprises a substrate, and supported by the substrate, a configuration to act as optical resonator and to absorb incident radiation of a band, including infrared. The configuration comprises: a resonant frontside structure facing the incident radiation; a backside structure and arranged between the frontside structure and the substrate; and a layer of an active material made from a semiconducting material, and configured to convert at least part of the incident radiation of the band into charge carriers. The frontside structure or the backside structure is made from electrically conducting material and is in contact with the active material. The configuration is configured to selectively absorb the incident radiation of the band. The frontside structure or the backside structure that is in contact with the active material is contacted by electrical contacts for sensing the charge carriers in the active material. The active material comprises amorphous or polycrystalline material.

Meta-surface photodetector

An infrared device comprises a substrate (), and arranged on or in the substrate () a configuration () for one of selectively emitting and selectively absorbing infrared radiation of a band, the configuration () comprising a pattern made from an electrically conducting material on a first level (L), an electrically conducting film () on a second level (L), and a dielectric layer () between the pattern and the film (). One or more of a heater () for heating the configuration (), and a thermal sensor () arranged for sensing the selective infrared radiation of the band absorbed by the configuration () on or in the substrate.

Infrared device

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Zurich, Switzerland

Alexander Lochbaum