Bruker Technologies Ltd.

Jordan Valley Semiconductors Ltd.

Jordan Valley Semiconductord Ltd

Alexander Krokhmal

Matthew Wormington

Asher Peled

Boris Yokhin

Yuri Vinshtein

Alex Dikopoltsev

David Berman

John Leonard Wall

Isaac Mazor

Amos Gvirtzman

Dileep Kumar Agnihotri

Alex Tokar

Tzachi Rafaeli

Paul Anthony Ryan

Dor Perry

Alexander Tokar

Alexander Brandt

Guy Sheaffer

David Jacques

Richard Bytheway

A system includes first and second imaging assemblies, and a processor. The first imaging assembly is configured to produce a first image of a measurement site in a sample. The second imaging assembly is coupled with a measurement assembly and is configured to produce a second image of the measurement site. The processor is configured to: (i) perform, based on the first image, a first movement of the sample relative to the measurement assembly, (ii) perform, based on the second image, a second movement of the sample for aligning the sample with the measurement assembly, and (iii) control the measurement assembly to perform a measurement in the measurement site.

Navigation accuracy using camera coupled with detector assembly

A method for evaluating a sample that includes an array of structural elements. The method includes obtaining a first small angle x-ray scattering (SAXS) pattern for a first angular relationship between the sample and an x-ray beam that exhibits a first collimation value and has a given cross-sectional area on a first side of the sample. A second SAXS pattern is obtained for a second angular relationship between the sample and the x-ray beam, while the x-ray beam exhibits a second collimation value that differs from the first collimation value while maintaining the given cross-sectional area of the x-ray beam on the first side of the sample, wherein the second angular relationship differs from the first angular relationship.

Small-angle X-ray scatterometry

A system for X-ray analysis, includes: (a) an X-ray analysis assembly configured to (i) direct an X-ray beam to impinge on a surface of a sample, and (ii) receive fluorescence radiation excited from the sample in response to the impinged X-ray beam, (b) a target assembly including measurement targets: placed in an optical path between the X-ray analysis assembly and the sample, and configured to move between (i) one or more first positions in which one or more of the measurement targets are positioned in the X-ray beam, and (ii) one or more second positions in which the optical path is unobstructed by the target assembly, and (c) a processor, configured to control movement of the target assembly between the first and second positions, for alternately, (i) monitoring properties of the X-ray beam using the measurement targets, and (ii) performing the X-ray analysis at a measurement site of the sample.

Monitoring properties of X-ray beam during X-ray analysis

An X-ray system includes, first and second X-ray channels (XCs), a spot sizer and a processor. The first XC is configured to: (i) direct a first X-ray beam for producing a spot on a surface of a sample, and (ii) produce a first signal responsively to a first X-ray radiation received from the surface. The spot sizer is positioned at a distance from the surface and is shaped and positioned to set the spot size by passing to the surface a portion of the first X-ray beam. The second XC is configured to: (i) direct a second X-ray beam to the surface, and (ii) produce a second signal responsively to a second X-ray radiation received from the surface, and the processor is configured to: (i) perform an analysis of the sample based on the first signal, and (ii) estimate the size of the spot based on the second signal.

Spot-size control in reflection-based and scatterometry-based X-ray metrology systems

A method for evaluating an array of high aspect ratio (HAR) structures on a sample includes illuminating the sample with an x-ray beam along a first axis parallel to within two degrees to the HAR structures in the array and sensing a first pattern of small angle x-ray scattering (SAXS) scattered from the sample while illuminating the sample along the first axis. The sample is illuminated with the x-ray beam along a second axis that is oblique to the HAR structures in the array, and a second pattern of the SAXS scattered from the sample is sensed while illuminating the sample along the second axis. Information is extracted with respect to the HAR structures based on the first and second patterns.

Small-angle x-ray scatterometry

An X-ray tube that may include a cathode that is configured to generate an electron beam; an anode having a cavity that has an opening; wherein the anode is configured to receive the electron beam through the opening and to emit, through the opening, in response to the receiving of the electron beam, an X-ray beam from the opening; and electron optics that are configured to direct the electron beam towards the opening following a path that outside the cavity and in a vicinity of the opening, differs from a path of propagation the X-ray beam.

X-ray tube

An x-ray apparatus, that may include a mount that is configured to hold a sample; an x-ray source, that is configured to direct an x-ray beam toward a first side of the sample; a detector, positioned downstream to a second side of the sample, the detector is configured to detect, during a sample measurement period, at least a part of x-rays that have been transmitted through the sample; and an x-ray intensity detector that is positioned, during a beam intensity monitoring period at a measurement position that is located between the x-ray source and the first side of the sample, so as to detect at least a part of the x-ray beam before the x-ray beam reaches the sample.

An X-ray apparatus includes a mount, an X-ray source, a detector, an optical gauge and a motor. The mount is configured to hold a planar sample having a first side, which is smooth, and a second side, which is opposite the first side and on which a pattern has been formed. The X-ray source is configured to direct a first beam of X-rays toward the first side of the sample. The detector is positioned on the second side of the sample so as to receive at least a part of the X-rays that have been transmitted through the sample and scattered from the pattern. The optical gauge is configured to direct a second beam of optical radiation toward the first side of the sample, to sense the optical radiation that is reflected from the first side of the sample, and to output a signal, in response to the sensed optical radiation, that is indicative of a position of the sample. The motor is configured to adjust an alignment between the detector and the sample in response to the signal.

Wafer alignment for small-angle x-ray scatterometry

An X-ray apparatus includes a mount, an X-ray source, a detector, an actuator, and a controller. The mount is configured to hold a sample. The X-ray source is configured to direct a beam of X-rays toward a first side of the sample. The detector is positioned on a second side of the sample, opposite the first side, so as to receive at least a portion of the X-rays that have been transmitted through the sample and to output signals indicative of an intensity of the received X-rays. The actuator is configured to scan the detector over a range of positions on the second side of the sample so as to measure the transmitted X-rays as a function of a scattering angle. The controller is coupled to receive the signals output by the detector and to control the actuator, responsively to the signals, so as to increase an acquisition time of the detector at first positions where the intensity of the received X-rays is weak relative to the acquisition time at second positions where the intensity of the received X-rays is strong.

X-ray detection optics for small-angle X-ray scatterometry

An X-ray apparatus includes a mount, an X-ray source, a detector and a beam limiter. The mount is configured to hold a planar sample. The X-ray source is configured to direct a beam of X-rays toward a first side of the sample. The detector is positioned on a second side of the sample, opposite the first side, so as to receive at least a part of the X-rays that have been transmitted through the sample. The beam limiter is positioned on the first side of the sample so as to intercept the beam of the X-rays. The beam limiter includes first and second blades and first and second actuators. The first and second blades have respective first and second edges positioned in mutual proximity so as to define a slit, through which the beam of the X-rays will pass, at a distance smaller than 25 mm from the first side of the sample. The first and second actuators are configured to shift the first and second blades along respective, first and second translation axes so as to adjust a width of the slit.

X-ray source optics for small-angle X-ray scatterometry

A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having multiple single-crystal layers, including at least a first layer and a second layer that is formed over and tilted relative to the first layer. The X-rays that are diffracted from each of the first and second layers are sensed simultaneously while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including at least a first diffraction peak due to the first layer and a second diffraction peak due to the second layer. The diffraction spectrum is analyzed so as to identify a characteristic of at least the second layer.

Fast measurement of X-ray diffraction from tilted layers

A method for analyzing a sample includes directing one or more beams of X-rays to impinge on an area of a surface of the sample on which a layer of nano-particles of a selected element has been formed. Secondary X-ray radiation from the area is detected responsively to the one or more beams. A distribution of the nano-particles on the surface is characterized based on the detected radiation.

X-ray measurement of properties of nano-particles

A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on a structure in the sample such that the X-rays are scattered from the structure in a pattern of stripes, and receiving the scattered X-rays using an array of detectors. A relative alignment between the sample and the array is adjusted so that the stripes are parallel to the detectors.

Target alignment for X-ray scattering measurements

Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. A motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.

Multifunction X-ray analysis system

A method for analysis of a sample includes irradiating an area of the sample with a polychromatic X-ray beam. X-rays scattered from the sample are detected using a plurality of detectors simultaneously in different, respective positions, whereby the detectors generate respective outputs. Energy-dispersive processing is applied to the outputs of the detectors so as to identify one or more X-ray diffraction lines of the sample.

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Haifa, Israel

Alexander Krokhmal