Asml Holding N.v.

Asml Netherlands B.v.

Oriel Corporation

Alexander Kremer

Roberto B Wiener

Richard Carl Zimmerman

Elizabeth Stone

Stanley Drazkiewicz

Erik Roelof Loopstra

Marcel Mathijs Theodore Marie Dierichs

Heine Melle Mulder

Hendrikus Robertus Marie Van Greevenbroek

Eric Brian Catey

David A Hult

The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors () configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.

Lithographic apparatus and ultraviolet radiation control system

Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.

Light attenuating filter for correcting field dependent ellipticity and uniformity

A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.

System and method for uniformity correction

A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.

Uniformity correction for lithographic apparatus

A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. 'pupils' are then superimposed onto the grid. Multiple second grids are also defined. Each '&#x201c;pupil'&#x201d; is mapped to a second grid such that the center of the second grid is coincident with the &#x201c;&#x201c;pupil&#x201d;&#x201d; center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and &#x201c;&#x201c;pupil&#x201d;&#x201d; mappings.

De-focus uniformity correction

Method for calculating an intensity integral for use in lithography systems

An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.

System for laser beam expansion without expanding spatial coherence

An apparatus for providing an astigmatically-reduced image with a spectroscopic instrument is disclosed which comprises a collimator which collimates electromagnetic radiation; a cylindrical mirror which receives and reflects the collimated electromagnetic radiation; a diffractor having a surface with a plurality of diffraction rulings inscribed thereon for diffracting electromagnetic radiation directed from the collimator; and a focuser which collects, focuses and directs diffracted electromagnetic radiation and directs it towards an exit aperture. In the preferred embodiment, the cylindrical mirror comprises a concave cylindrical mirror positioned such that the cylindrical axis is substantially normal to rulings on the diffractor. In another preferred embodiment, the cylindrical mirror is convex and is positioned such that the cylindrical axis is substantially parallel to rulings on the diffractor.

Growing community of inventors

Stamford, CT, United States of America

Alexander Kremer