Ifire Technology Corp.

Ifire IP Corporation

Xerox Corporation

Alexander Kosyachkov

Joe Acchione

Guo Liu

Yue (Helen) Xu

Igor Kubelik

Xingwei Wu

Vincent Joseph Alfred Pugliese

Stephen Charles Cool

James Alexander Stiles

Rossitza Ivanova

Dung Nguen

Lech Jedral

A physical vapor deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.

Reactive metal sources and deposition method for thioaluminate phosphors

The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapor deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.

Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films

An improved fine grained zinc sulfide phosphor is provided for use in ac electroluminescent displays. The fine-grained zinc sulfide phosphor film exhibits improved luminance and may be used in conjunction with a structure or substance to minimize or prevent reaction of the fine grained phosphor with oxygen. The invention is particularly applicable to zinc sulfide phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.

Fine-grained rare earth activated zinc sulfide phosphors for electroluminescent displays

The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method comprises sputtering a single composite target in a low pressure sputtering atmosphere that comprises gases containing reactive species and non-reactive species. The composite target comprising a matrix phase and an inclusion phase, or two matrix phases, wherein one of the phases comprises one or more metallic elements that contribute to the composition of the phosphor and the other of the phases comprises the remaining elements that contribute to the composition of the phosphor. In the method the pressure of the reactive species within the sputtering atmosphere is varied to control the sputtering rate of the matrix and inclusion phases of the composite target to cause the ratio of the elements in the two phases to deposit in a desired ratio as a phosphor film on the substrate.

Composite sputter target and phosphor deposition method

A novel structure is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and a silicon oxynitride layer provided directly adjacent the top and/or bottom of the phosphor thin film layer, wherein said silicon oxynitride layer comprises a composition of SiNOHwhere 2&#x2266;x&#x2266;4, 0&#x3c;y&#x2266;2 and 0&#x2266;z&#x2266;1. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.

Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays

A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the pre-determined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAlS:Eu), and barium magnesium thioaluminates.

Single source sputtering of thioaluminate phosphor films

The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications.

Sputter deposition process for electroluminescent phosphors

A print head suitable for use in an image forming system is provided having a pair of electrode layers separated by an isolating structure that includes a semiconductor. The presence of the semiconductor, such as a semiconductor layer, extends the life of the print head by reducing degradation of the print head.

Charge emitting print head for image forming systems

A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the predetermined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl S :Eu), and barium magnesium thioaluminates.

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Mississauga, Canada

Alexander Kosyachkov