Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Carl-zeiss-stiftung

Carl Zelss Smt Ag

Alexander Kohl

Hubert Holderer

Ulrich Weber

Markus Deguenther

Bernhard Gellrich

Michael Patra

Michael Layh

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Gerhard-Wilhelm Ziegler

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Erich Schubert

Raoul Reiner

Markus Neumaier

Toralf Gruner

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Manfred Maul

Thomas Petasch

Winfried M Kaiser

Klaus Guenther Beck

Baerbel Trossbach

Cornelia Roesch

Werner Lang

Jens Kugler

Christian Wagner

Jochen Becker

Martin Brunotte

Sascha Kraus

Jürgen Hartmaier

Birgit Mecking

Wolfgang Singer

Damian Fiolka

Armin Schoeppach

Christoph Zaczek

Gerhard Fuerter

Martin Weiser

Markus Brotsack

Joerg Schultz

Baerbel Schwaer

Stephan Back

Reiner Garreis

Erwin Gaber

Michael Mühlbeyer

Hartmut Muenker

Jens Ullmann

Markus Degünther

Chris Reed

Dragos Pariza

Mike Meehan

Hartmut Brandenburg

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Reiner Raoul

An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

Microlithographic projection exposure apparatus illumination optics

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Imaging device in a projection exposure machine

A arrangement serves for the adjustment of an optical element (), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element () is mounted in a mount () by means of a number of bearing feet () distributed over the circumference of the optical element () and is selectively deformable by actuators (). At least some of the bearing feet () are engaged by the actuators () in a region of the respective bearing foot () in such a way that the respective bearing foot () can be displaced in the direction of the optical axis ().

Adjustment arrangement of an optical element

An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include an optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface.

Optical beam transformation system and illumination system comprising an optical beam transformation system

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Growing community of inventors

Aalen, Germany

Alexander Kohl