Panalytical B.v.

Malvern Panalytical B.v.

Alexander Kharchenko

Milen Gateshki

Detlef Beckers

Waltherus W Van Den Hoogenhof

Petronella Emerentiana Hegeman

Charalampos Zarkadas

Roger Meier

Walter Van Den Hoogenhof

Klaus Lischka

Eugene Reuvekamp

Nicholas Norberg

Dick Kuiper

The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 μm. In the second X-ray analysis mode the X-ray source operates at a second operating power that is higher than the first operating power, and the area of the effective focal spot is larger than the area of the effective focal spot in the first X-ray analysis mode.

Adaptable X-ray analysis apparatus

A beam shaping apparatus () for use in an X-ray analysis device (). The beam shaping apparatus processes an input beam () from an X-ray beam source (), and generates an output beam () with an output beam shape for irradiating a sample () held by a sample holder () of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (χ) of the sample (), this defined by a tilt position of the sample holder ().

X-ray beam shaping apparatus and method

An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

High resolution X-ray diffraction method and apparatus

Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle &#x3c8;to the surface of the sample and measuring a measured intensity I(&#x3b8;) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle &#x3c8;corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.

Quantitative X-ray analysis&#x2014;matrix thickness correction

An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray sourcecreating an incident X-ray beam directed to a sample on a sample stage. An X-ray detection system is mounted at a fixed anglefor high energy energy dispersive XRD For XRF, an X-ray detection system is used.

X-ray diffraction and fluorescence

A monochromatoris used to direct X-rays from X-ray sourceonto a sampleas a convergent beam. The sampleis in a growth chamber. The sample is rotated, and diffraction measurements are made in parallel with multichannel detector. A specific reflection is used so that the intensity against angle graph measured in the multichannel detector gives information about the vertical lattice parameter. To compensate for wobble inevitably introduced by the rotation of the sample, short time measurements are made and summed.

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Almelo, Netherlands

Alexander Kharchenko