Carl Zeiss Jena Gmbh

Carl Zeiss Smt Gmbh

Carl Zeiss Ag

Carl Zeiss Meditec Ag

Alexander Gratzke

Martin Hacker

Bryce Anton Moffat

Axel Krause

Christoph Nieten

Peter Klopfleisch

Dirk Doering

Norbert Wabra

Boris Bittner

Guenter Rudolph

Enrico Geissler

Sonja Schneider

Ricarda Schoemer

Johannes Zellner

Martin Von Hodenberg

Marcus Heidkamp

Enrico Geiβler

Arne Schob

Stephan Merkel

An illumination apparatus includes a first solid-state-based illumination module, a second solid-state-based illumination module, and a superposition unit, which couples first and the second luminescence radiation into an illumination beam path, in which said radiation is guided up to the end of the illumination beam path in order to illuminate a light modulator. A filter unit which filters light with a second color from the first luminescence radiation with a first color and from the second luminescence radiation such that light with the first and second color is present at the end of the illumination beam path.

Illumination device for a projector having a light modulator

An illumination apparatus for a projector that includes a light modulator is provided. The illumination apparatus includes a first illumination module emitting first radiation, a second illumination module emitting second radiation, a light mixing rod extending in the axial direction and a superposition unit, which superposes the first and second radiation and couples this into the light mixing rod. The superposition unit includes a first imaging optical unit which focuses the first radiation into the light mixing rod such that a first focus is present, and a second imaging optical unit which focuses the second radiation into the light mixing rod such that a second focus is present. The first focus is spaced apart from the second focus in the axial direction.

In a projector for projecting a multi-colored image, a control unit actuates each color channel with reference to fed-in image data such that one of the color subframes of the multi-colored image to be projected is generated. A projection optical system images the generated color subframes onto a projection surface such that the color subframes can be perceived as the multi-colored image to be projected. Each color channel is formed for the generation of a color subframe of a predetermined base color. The color location of the predetermined base color varies with the lightness to be generated. The control unit controls each color channel such that, for at least one picture point in the multi-colored image, the color location shift of the predetermined target color location caused by the color channel or the color channels is compensated for while retaining the target lightness.

Projector for projecting a multi-colored image

Each modulator of an image projector includes multiple pixels arranged in rows and columns, switchable independently of each other into a first state, in which light incident on them is used to generate an image, and into a second state, in which light incident on them is not used to generate an image. At least one first pixel is assigned to each second pixel such that the imaging optical system a) strikes the second pixel with light from the respective assigned first pixel when the assigned first pixel is switched into the first state, in order to illuminate the second pixel actively, and b) does not strike the second pixel it with light from the respective assigned first pixel when the assigned first pixel is switched into the second state, in order not to illuminate the second pixel actively. A control unit that controls the modulators is also disclosed.

Projector for projecting images

A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.

Projection objective of a microlithographic projection exposure apparatus

Growing community of inventors

Jena, Germany

Alexander Gratzke