Kla-tencor Mie Gmbh

Arvinmeritor Gmbh

Alexander Büttner

Lambert Danner

Albert Kreh

Henning Backhauss

Matthias Ludwig

Wolfgang Vollrath

Frank Niebuhr

Roland Hedrich

Gerhard Hoppen

Kurt Hahn

Christof Krampe-Zadler

Hermann Bittner

Tobias Niesner

Harald Batke

Herbert Beck

Hans Langhoff

Sven Hardel

An apparatus () for the optical inspection of wafers is disclosed, which comprises an assembly unit () which carries optical elements () of at least one illumination path () for a bright field illumination and optical elements () of at least one illumination path () for a dark field illumination. The assembly unit () furthermore carries plural optical elements () of at least one detection path (). An imaging optical element () of the at least one illumination path () for the bright field illumination (), imaging optical elements () of the at least one illumination path for the dark field illumination, and imaging optical elements () of the at least one detection path () are designed in such a way that all illumination paths () and all detection paths () are telecentric.

Apparatus for the optical inspection of wafers

Growing community of inventors

Weilburg, Germany

Alexander Büttner