Seagate Technology Incorporated

Alexander Boris Khazanov

Kuo-Hsing Hwang

Paul Stephen McLeod

Chung-Yuang Shih

Shanghsien Alex Rou

Mark Anthony Shows

Jie-Ming Yu

Stella Tan

Abdellah Hafid

Xiaohua Chen

Quy Cuu Nguyen

Selective deposition of a layer of a material, such as a thick protective overcoat, onto a selected substrate area, such as the inner or CSS landing zone, is achieved using a sputtering target assembly comprising a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield positioned proximate the sputtering surface and surrounding at least a portion of the erosion track area, the collimating shield including an inwardly facing wall, and a blocking shield centrally positioned over the surface of the target/cathode and including an outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall of the central blocking shield form an open-ended collimating channel for directing sputtered particles onto the selected substrate area.

Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone

A sputtering target assembly for depositing onto a selected substrate area comprises a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield positioned proximate to the sputtering surface, surrounding at least a portion of the erosion track area, and including an inwardly facing wall, and a blocking shield centrally positioned over the surface of the target/cathode and including an outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall of the central blocking shield form an open-ended channel for directing sputtered particles onto the selected substrate area. A method for utilizing the target assembly for selectively depositing a thicker protective overcoat layer on the inner CSS or landing zone relative to the outer data zone of disk-shaped recording media is provided.

A magnetic disc for use in a magnetic disc drive is provided. The magnetic disc includes a recording surface wherein the recording surface includes a dual phase carbon overcoat. The dual phase carbon overcoat includes an amorphous carbon film sputtered on a magnetic layer. A doped amorphous carbon film is sputtered on the amorphous carbon film. The dual phase carbon overcoat has demonstrated improved hardness, reduced stiction and superior corrosion resistance over the prior art. A method of manufacturing the magnetic disc is also provided. The method includes providing a sputtering apparatus having a process chamber, providing a partially manufactured magnetic disc having a magnetic layer thereon, placing the partially manufactured magnetic disc within the process chamber, sputtering an amorphous carbon film on the magnetic layer, and sputtering a doped amorphous carbon film on the amorphous carbon film. The process reduces throughput inefficiencies due to down time cleaning and avoids carbon induced damage to the discs.

Multi-phase carbon overcoats for magnetic discs

Multi-phase overcoats for magnetic discs

Growing community of inventors

Mountain View, CA, United States of America

Alexander Boris Khazanov