Nxp B.v.

Asml Netherlands B.v.

St-Ericsson Sa

Alexander Alexandrovich Danilin

Martinus Theodorus Bennebroek

Sergei V Sawitzki

Boris Menchtchikov

Alexander Viktorovych Padiy

Richard P Kleihorst

Paul Wielage

Alejandro Xabier Arrizabalaga Uriarte

Measurement data is obtained for calibration fields that have been exposed by a lithographic apparatus using different field layouts and exposure sequences. The measurement data is classified in subsets by scan direction, step direction, field size and other variables. The measurement data is indexed by a time value that varies through each exposure sequence. Time values within different exposure sequences can be related using a normalized time value based on the beginning and end of each exposure sequence. An inter-field performance model is calculated for each subset. An intra-field component of a performance model is calculated with time as a third dimension. The time-indexed performance model is used to determine intra-field corrections for a variety of product exposures having product layouts and product exposure sequences different to the calibration fields, based on time and other a variables of the product layout and product exposure sequence.

Method of predicting performance of a lithographic apparatus, calibration of lithographic apparatus, device manufacturing method

A method of calibrating a substrate positioning system of a lithographic apparatus, the method including: exposing a pattern with the lithographic apparatus on an exposed layer on the surface of a substrate having a reference layer, wherein the pattern corresponds to a movement of the substrate by the substrate positioning system; measuring overlay data between the exposed layer and the reference layer on a plurality of positions on the substrate; transforming the overlay data from a spatial domain to a frequency domain by a discrete cosine transformation; modifying the overlay data in the frequency domain by selecting a subset of the overlay data; transforming the modified overlay data from the frequency domain back to the spatial domain by an inverse discrete cosine transformation; calibrating the substrate positioning system by using the modified overlay data in the spatial domain.

Lithographic cluster system, method for calibrating a positioning device of a lithographic apparatus

A SIMD parallel processor is described comprising an array comprising processing elements, associated data storage components and access means configured to enable access to at least one of the data storage components associated with at least one of the processing elements; a control processor; memory control means configured to enable addressing of at least one of the access means for the control processor; and connecting means configured to connect the memory control means to the access means.

SIMD parallel processor architecture

The configurable logic device comprises a plurality of configurable logic cells (). A configurable logic cell comprises a plurality of multi-bit registers (). At least one is accessible both in a parallel and in a serial fashion. A functional unit () therein is coupled to two or more of the registers and comprises a chain of functional unit segments (') that each comprise an AND gate () and a 1-bit full adder () receiving an output of the AND-gate. An output selection facility () provides an output signal of the configurable logic cell selected from two or more input signals. At least one of the input signals is provided by one of the multi-bit registers, and another by the functional unit.

Configurable logic device

An integrated circuit comprises a matrix () of programmable cells (). Each particular one of the programmable cells () comprises a programmable logic circuit () and a bank () of routing multiplexers (-). Each routing multiplexer (-) in the bank () has a set of inputs connected to connections selected from a group consisting of connections to an output of the programmable logic circuit () and connections dedicated to outputs of routing multiplexers (-) in further ones of the programmable cells () other than the particular one of the programmable cells (). The further ones of the programmable cells () the inputs of the routing multiplexer (-) in the bank () are connected to are positioned relative to the particular one of the programmable cells () in the matrix () in neighboring cells () of the particular one of the programmable cells () and in cells () beyond the neighboring cells ().

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Eindhoven, Netherlands

Alexander Alexandrovich Danilin