Asml Netherlands B.v.

Alex Van Zon

Ralph Brinkhof

Carolus Johannes Catharina Schoormans

Johannes Mathias Theodorus Antonius Adriaens

Arthur Winfried Eduardus Minnaert

Cornelis Henricus Van De Vin

Willem Herman Gertruda Anna Koenen

Thomas Josephus Maria Castenmiller

Tasja Van Rhee

Michael Broers

Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.

Calibration method for a lithographic apparatus

A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.

Method for positioning a target portion of a substrate with respect to a focal plane of a projection system

A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.

Lithographic apparatus, system, method, computer program, and apparatus for height map analysis

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Waalre, Netherlands

Alex Van Zon