Novellus Systems Incorporated

Gasonics International Corporation

Aleksandr Kabansky

Krishnan Shrinivasan

Karen Ann Reinhardt

Syed S Basha

Vladimir Starov

Shmuel Erez

Ravi Vellanki

Arkadiy I Shimanovich

Adherent matrix layers such as post-etch and other post-process residues are removed from a substrate by exposing them to a vapor phase solvent to allow penetration of the vapor phase solvent into the adherent matrix layers and condensing the vapor phase solvent into the adherent matrix layers and revaporized to promote fragmentation of the matrix and facilitate removal. Megasonic energy may be transmitted via a transmission member to the adherent matrix through the solvent condensed thereon to loosen fragments and particles. The substrate is typically rotated to improve contact between the megasonic energy transmission member and the condensed solvent and achieve more uniform cleaning. A co-solvent which is soluble in the vapor phase solvent may be added to enhance removal of specific adherent matrix materials. A plasma pretreatment may be employed to react with and modify the matrix in a way that improves subsequent penetration by the vapor phase solvent and fragmentation of the adherent matrix for more complete removal from the substrate.

Method and apparatus for removing post-etch residues and other adherent matrices

Growing community of inventors

Santa Clara, CA, United States of America

Aleksandr Kabansky