Carl Zeiss Smt Gmbh

Carl Zeiss Microscopy Gmbh

Carl-zeiss-smt Ag

Leybold Gmbh

Albrecht Ranck

Michel Aliman

Hin Yiu Anthony Chung

Gennady Fedosenko

Wilhelm Ulrich

Aurelian Dodoc

Hubert Holderer

Bernhard Gellrich

Hans-Juergen Rostalski

Susanne Beder

Ulrich Loering

Andreas Wurmbrand

Juergen Fischer

Leonid Gorkhover

Karl Heinz Schuster

Joerg Mallmann

A method includes parallel or serial ionization of a gas mixture by activating at least two ionization devices operating using different ionization procedures, and/or by ionizing the gas mixture in a detector to which the gas mixture and ions and/or metastable particles of an ionization gas are fed. The method also includes detecting the ionized gas mixture in the detector for the mass spectrometric examination thereof. A mass spectrometer for mass spectrometric examination of gas mixtures includes an ionization unit for ionizing a gas mixture and a detector for detecting the ionized gas mixture.

Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor

The disclosure relates to a mass spectrometer for mass spectrometric examination of gas mixtures, including: an ionization device and an ion trap for storage and mass spectrometric examination of the gas mixture. In one aspect of the disclosure, the ionization device is embodied for supplying ions and/or metastable particles of an ionization gas and/or for supplying electrons to the ion trap for ionizing the gas mixture to be examined and the mass spectrometer is embodied to determine the number of ions and/or metastable particles of the ionization gas present in the ion trap and/or the number of ions of a residual gas present in the ion trap prior to examining the gas mixture. The disclosure also relates to the use of such a mass spectrometer and a method for mass spectrometric examination of a gas mixture.

Mass spectrometer, use thereof, and method for the mass spectrometric examination of a gas mixture

A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

Microlithographic projection exposure apparatus

Growing community of inventors

Aalen, Germany

Albrecht Ranck