Air Products and Chemicals, Inc.

Imec Vzw

Interuniversitair Microelektronica Centrum (imec)

Albrecht Fester

Paul Mertens

Rita Vos

Oliver Doll

Bernd Kolbesen

The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula ( 1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to 1 or 2; R being a chemical group with the chemical formula (1a'), wherein q is equal to 1, 2 or 3; wherein R, Rand Rare independently selected from the group consisting of hydrogen and an organic group. The second compound has the chemical formula (1c). Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate. 

Semiconductor cleaning solution

The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate 

Composition comprising an oxidizing and complexing compound

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Frankfurt am Main, Germany

Albrecht Fester