Asml Netherlands B.v.

Albert Pieter Rijpma

Nicolaas Ten Kate

Hans Jansen

Michel Riepen

Franciscus Johannes Joseph Janssen

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Leon Martin Levasier

Dzmitry Labetski

Yuri Johannes Gabriël Van De Vijver

Marcio Alexandre Cano Miranda

Hendrikus Gijsbertus Schimmel

Johannes Christiaan Leonardus Franken

Danny Maria Hubertus Philips

Martinus Agnes Willem Cuijpers

Ramin Badie

Henricus Jozef Castelijns

Wilbert Jan Mestrom

Roger Wilhelmus Antonius Henricus Schmitz

Manish Ranjan

Oleg Voznyi

Alain Louis Claude Leroux

Kursat Bal

Peter Van Putten

Jacob Brinkert

Oleksiy Galaktionov

Jan Okke Nieuwenkamp

Gerrit Van Der Straaten

Brian Vernon Virgo

Tjarko Adriaan Rudolf Van Empel

Laurentius Johannes Adrianus Van Bokhoven

Raimond Visser

Johannes Hendrikus Gertrudis Franssen

Reinier Theodorus Martinus Jilisen

Albert Brals

Anko Jozef Cornelus Sijben

Dennis Jozef Maria Paulussen

Wim Ronald Kampinga

Zongquan Yang

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.

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Veldhoven, Netherlands

Albert Pieter Rijpma