Intel Corporation

Albert Kwok

Han-Ming Wu

Tsukasa Abe

Damon R Waring

Keith L Kao

Y Long He

Methods and systems may include high speed camera to capture a video of a display output, a robotic arm to interact with a device, a processor, and a computer readable storage medium having a set of instructions. If executed by the processor, the instructions cause the system to identify one or more user experience characteristics based on the captured video, and generate a report based on the one or more user experience characteristics. The report may include a perceptional model score that is generated based on the user experience characteristics as well as other parameters. The user experience characteristics could include response time, frame rate and run time characteristics.

Measuring device user experience through display outputs

Plasma etching is controlled utilizing two etchant gases to form a plasma so as to obtain controlled (e.g., uniform) etch rate across a wafer. One etchant gas forms a positive plasma, which is the dominant plasma. The other etchant gas forms a negative plasma, which is the secondary plasma. The ratio of dominant plasma to the secondary plasma can be adjusted such that ion densities are uniform across the wafer, resulting in uniform etch rate over the wafer.

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Fremont, CA, United States of America

Albert Kwok