Asml Netherlands B.v.

Albert Johannes Maria Jansen

Marcel Koenraad Marie Baggen

Raymond Laurentius Johannes Schrijver

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Johannes Jacobus Matheus Baselmans

Nicolaas Ten Kate

Engelbertus Antonius Fransiscus Van Der Pasch

Marco Koert Stavenga

Andre Bernardus Jeunink

Richard Joseph Bruls

Koen Steffens

Tammo Uitterdijk

Laurentius Johannes Adrianus Van Bokhoven

Jan Jaap Kuit

Johannes Christiaan Maria Jasper

Jan Frederik Hoogkamp

Dirk-Jan Bijvoet

Jeroen Gerard Gosen

Willem Herman Gertruda Anna Koenen

Koen Cuypers

Frank Auer

Henricus Jozef Castelijns

Willem Richard Pongers

Johannes Mathias Theodorus Antonius Adriaens

Suzanne Johanna Antonetta Geertruda Cosijns

Jan-Jaap Kuit

Peter Schaap

Arjan Martin Van Der Wel

Hubrecht Bastiaan Jasperse

Peterjan Broomans

Sebastiaan Smit

Joris Wilhelmus Henricus Vermunt

Joep Janssen

A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Substrate positioning system, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

Lithographic apparatus and a device manufacturing method

A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.

Stage apparatus, lithographic apparatus and device manufacturing method

A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.

Lithographic apparatus and device manufacturing method

In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.

Growing community of inventors

Eindhoven, Netherlands

Albert Johannes Maria Jansen