Applied Materials, Inc.

Albert Barrett Hicks, Iii

Jennifer Y Sun

Philip Allan Kraus

Mark Joseph Saly

Kallol Bera

Michael D Willwerth

Prerna Sonthalia Goradia

Leonard Michael Tedeschi

Yaoling Pan

Patrick John Tae

Daniel Thomas McCormick

Lisa J Enman

Xiaopu Li

Nitin Deepak

Gayatri Natu

Serghei Malkov

A method including receiving, by a processing device, image data characterizing light reflected from of a film disposed on a processed surface of a substrate. The image data corresponds to one or more locations across a surface of the film and indicates a camera perspective angle associated with capturing the image data. The method further includes determining, by the processing device using the image data, reflection data indicating reflection effect of the light reflected from the film. The method further includes processing the reflection data using one or more machine-learning model (MLMs). The method further includes determining one or more process result metrics of the film corresponding to the one or more locations. The method may further includes preparing the one or more process result metrics for display on a graphical user interface (GUI). The method may further include preparing the one or more process result metrics for processing in a script-based environment.

Chemical-dose substrate deposition monitoring

Methods of forming a metal oxyfluoride films are provided. A substrate is placed in an atomic layer deposition (ALD) chamber having a processing region. Flows of zirconium-containing gas, a zirconium precursor gas, for example, Tris(dimethylamino)cyclopentadienyl zirconium, an oxygen-containing gas, a fluorine containing gas, and an yttrium precursor, for example, tris(butylcyclopentadienyl)yttrium gas are delivered to the processing region, where a metal oxyfluoride film such as an yttrium zirconium oxyfluoride film, is formed.

Metal oxyfluoride film formation methods

Embodiments disclosed herein comprise a sensor. In an embodiment, the sensor comprises a substrate having a first surface and a second surface opposite from the first surface. In an embodiment, the sensor further comprises a first electrode over the first surface of the substrate, and a second electrode over the first surface of the substrate and adjacent to the first electrode. In an embodiment, the sensor further comprises a barrier layer over the first electrode and the second electrode.

Capacitive sensor for chamber condition monitoring

Growing community of inventors

Santa Clara, CA, United States of America

Albert Barrett Hicks, Iii