Applied Materials, Inc.

Novellus Systems Incorporated

Alan R Popiolkowski

Shannon M Hart

Marc O Schweitzer

Alan Liu

Jennifer L Watia

Joseph Yudovsky

Brian T West

Evan E Patton

Semyon Sherstinsky

Umesh M Kelkar

Paul F Smith

Nitin Khurana

Leonel Arturo Zuniga

Mark D Menzie

Ted G Yoshidome

Percival Verdeflor

Rod Mosely

Alison Gilliam

Adjustable chemical vapor deposition showerhead assembly

A textured process shield and similar parts may be formed and textured in the same forming process using a mandrel. The mandrel may have movable portions that may be set into a forming die position to form and texture a workpiece into a process shield and collapsed to allow the process shield to be removed from the mandrel. The movable portions may include several textured shoes supported by movable jaws. The movable portions may also include a contact surface having angled indentations.

Method and apparatus for forming and texturing process shields

A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.

Method of surface texturizing

A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.

A gas delivery apparatus and method for directing a flow of gas to the edge of a substrate at an angle to the radial direction of the substrate is provided. The apparatus directs the gas from a gas opening, over a plurality of grooves that are angled relative to a radial line originating at a center of the gas delivery apparatus. Subsequently, the gas is flowed over a portion of the substrate to prevent reactive gases from depositing on selective portions of the substrate.

Heater for processing chamber

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Los Banos, CA, United States of America

Alan R Popiolkowski