Rohm and Haas Company

Rohm and Haas Electronic Materials Cmp Holdings, Inc.

Rohm & Haas Electronic Materials LLC

Alan Isami Nakatani

Mary Jo Kulp

David Goodro Kelly

Adam Loyack

Charles R Szmanda

Curtis Alan Schwartz

Lujia Bu

Miao Wang

Edward Greer

Katherine Sue Rice

Georg R Kestler

Richard Karpowicz

Edward C Greer

The present invention provides a hair styling composition comprising (a) 1% to 10% by weight of at least one polymer comprising, as polymerized units, one or more monomers having at least one acid-functional group; (b) 99% to 90% by weight of a solvent mixture comprising: (i) 5% to 100% by weight of at least one volatile organic solvent; (ii) 95% to 0% by weight of water, and (iii) 0% to 80% by weight of at least one propellant; and (c) a neutralizer, wherein the mole ratio of said neutralizer to the acid-functional groups on said polymer (a) is from 0:1 to 1.2:1, and the neutralizer comprises: (i) 10% to 30% neutralization of the acid group of the polymer by tetrabutylammonium hydroxide, and (ii) 90% to 70% neutralization of the acid group of the polymer by aminomethyl propanol. More particularly, the polymer (a) may comprise, as polymerized units, (i) 30% to 75% by weight of one or more monomer that has refractive index of 1.490 or higher, (ii) 1% to 30% by weight of one or more acid-functional monomer, and (iii) 5% to 69% by weight of one or more additional monomer. The hair styling composition of the present invention has improved clarity and humidity resistance.

Hair styling compositions with improved clarity and humidity resistance

The polishing pad is useful for polishing at least one of magnetic, optical and semiconductor substrates. The polishing pad includes a polishing layer having a polyurethane window. The polyurethane window has a cross-linked structure formed with an aliphatic or cycloaliphatic isocyanate and a polyol in a prepolymer mixture. The prepolymer mixture is reacted with a chain extender having OH or NHgroups and having an OH or NHto unreacted NCO stoichiometry less than 95%. The polyurethane window has a time dependent strain less than or equal to 0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60&#xb0; C. at 140 minutes, a Shore D hardness of 45 to 90 and an optical double pass transmission of at least 15% at a wavelength of 400 nm for a sample thickness of 1.3 mm.

Creep-resistant polishing pad window

A chemical mechanical polishing pad is provided, comprising: a polishing layer having a polishing surface; and, a light stable polymeric endpoint detection window, comprising: a polyurethane reaction product of an aromatic polyamine containing amine moieties and an isocyanate terminated prepolymer polyol containing unreacted &#x2014;NCO moieties; and, a light stabilizer component comprising at least one of a UV absorber and a hindered amine light stabilizer; wherein the aromatic polyamine and the isocyanate terminated prepolymer polyol are provided at an amine moiety to unreacted &#x2014;NCO moiety stoichiometric ratio of &#x3c;95%; wherein the light stable polymeric endpoint detection window exhibits a time dependent strain of &#x2266;0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60&#xb0; C. at 100 minutes and an optical double pass transmission of &#x2267;15% at a wavelength of 380 nm for a window thickness of 1.3 mm; and, wherein the polishing surface is adapted for polishing a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate. Also provided is a method of polishing a substrate (preferably a semiconductor wafer) using the chemical mechanical polishing pad provided.

Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith

Curable compositions are disclosed. Also disclosed are optical media comprising said curable compositions when cured and methods of making such optical media.

Curable compositions

Protective film forming compositions useful as medical films and other related wound care and treatment articles, including liquid bandages are prepared from emulsion polymers, including a polymer blend including at least one hard emulsion polymer component and at least one soft emulsion polymer component, having the required dynamic storage modulus and mean Tg of the hard and soft polymer blend components.

Medical films and articles prepared from emulsion polymers

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Lansdale, PA, United States of America

Alan Isami Nakatani