The Secretary of State for Defence in Her Britannic Majesty's Government

Alan F Cattell

John Kirton

Peter A Lloyd

Brian Cockayne

Peter J Wright

A method of electroluminescent panel manufacture in which a doped zinc chalcogenide phospher film--for example manganese doped zinc sulphide, is deposited upon an electrode bearing substrate in the presence of a hydrogen enriched atmosphere--for example a 90%:10% argon:hydrogen atmosphere. This is followed by rapid anneal treatment, the substrate being raised quickly to a temperature of 450.degree. C., or greater, and cooled rapidly. It is preferable that, prior to film deposition, the substrate is pretreated by baking in the hydrogen enriched atmosphere. An additional current density limiting film may be applied--a film of low resistance cermet material--for example silica/nickel 20% Ni in SiO.sub.2, or a film of amorphous silicon.

Electroluminescent device

A method in which a phosphor film of manganese doped zinc chalcogenide is produced by chemical vapor deposition from alkyl zinc vapor and the gaseous hydride of the chalcogen. The manganese dopant is introduced uniformly during deposition by decomposition of tricarbonyl alkylcyclopentadienyl manganese: ##STR1## where here R denotes the alkyl radical. Preferably dimethyl zinc and tricarbonyl methylcyclopentadienyl manganese are used. The phosphor produced may be one of the following manganese doped compounds: zinc sulphide, zinc selenide, zinc sulphur selenide, zinc oxy-sulphide, zinc oxy-selenide or zinc cadmium sulphide.

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Malvern, United Kingdom

Alan F Cattell