Columbia University

Alan Bigelow

David Jonathan Brenner

Gerhard Randers-Pehrson

Henry Spotnitz

Randers-Pehrson Gerhard

Certain exemplary embodiments of the present disclosure can provide an apparatus and method for generating at least one radiation can be provided. The exemplary apparatus and/or method can selectively kill and/or affect at least one virus. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or more wavelengths provided in a range of about 200 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range can be provided or which can be substantially harmful to cells of the body.

Apparatus, method and system for selectively affecting and/or killing a virus

Certain exemplary embodiments can provide an apparatus and method for generating at least one radiation. The exemplary apparatus and/or method can selectively kill and/or affect at least one bacteria. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or more wavelengths provided in a range of about 190 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range.

Apparatus, method, and system for selectively effecting and/or killing bacteria

An exemplary ultraviolet (UV) arrangement, can be provided, which can include, for example, a lumen structured to be inserted into a body of a patient and pass a percutaneous structure therethrough into the body of the patient, wherein the lumen can be configured to disperse or provide a UV radiation, and an optical arrangement coupled to the lumen, and configured to generate the UV radiation, and provide the UV radiation to the lumen to be dispersed or provided by the lumen. The lumen can include a weave of a plurality of strands. The optical arrangement can include an optical fiber(s) coupled to the lumen at one of the strands. The optical arrangement can include a plurality of optical fibers coupled to the lumen, where the optical arrangement can include a plurality of diffusing rings, and wherein each ring can be connected to one of the optical fibers.

Ultraviolet sleeves for percutaneous devices and methods for using and/or providing the same

Certain exemplary embodiments of the present disclosure can provide an apparatus and method for generating at least one radiation. The exemplary apparatus and/or method can selectively kill and/or affect at least one bacteria. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or more wavelengths provided in a range of about 190 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range.

Apparatus, method and system for selectively effecting and/or killing bacteria

Certain exemplary embodiments of the present disclosure can provide an apparatus and method for generating at least one radiation can be provided. The exemplary apparatus and for method can selectively kill and/or affect at least one bacteria. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or More wavelengths provided in a range of about 190 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range.

Certain exemplary embodiments of the present disclosure can provide an apparatus and method for generating at least one radiation can be provided. The exemplary apparatus and/or method can selectively kill and/or affect at least one bacteria. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or more wavelengths provided in a range of about 190 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range can be provided.

Growing community of inventors

Nyack, NY, United States of America

Alan Bigelow