Centre National De La Recherche Scientifique

Recif, Societe Anonyme

Recif Sa

Alpha Mos S.a.

Other

Nanophotonics Ag

Recif Technologies Sas

Alpha M.o.s.

Alain Gaudon

Pierre Astegno

Michael Abraham

François Loubet

Chang Hyun Shim

Philippe Menini

Ekaterina Esteve

Ivo J M M Raaijmakers

Francois Loubet

Franck Benhamouda

Mohammed El Jarjini

Jean Christophe Mifsud

Christophe Lero

The sensitivity and/or selectivity of a chemoresistor type gas sensor is enhanced by measuring the response of the sensing material to a gas sample while the sensing material is subjected to illumination using specially-tailored pulses of ultraviolet radiation. For a given target gas to be detected there is an optimal duration of the UV pulses to achieve peak sensitivity of the sensing material.

Sensitivity and selectivity of chemoresistor type gas sensors

A multi-storey gas sensor is constructed by stacking chemoresistor type gas sensing elements and providing holes through each sensing element so gas can pass from one sensing element to the next, through the sensing layers. A rich data set can be obtained by selecting appropriate combinations of materials for the different sensing layers and varying the operating conditions of the different gas-sensing elements by: taking measurements when different combinations of sensing layers are activated, when given sensing layers are heated to different temperatures or according to different heating profiles, and/or when selected sensing layers are exposed to UV light. Sensor sensitivity and selectivity can be increased by applying UV pulses of controlled duration, and target gas species can be detected based on the transient response of the sensing layer at onset of UV irradiation. Each sensing element may have a micro-hotplate architecture.

Chemoresistor type gas sensor having a multi-storey architecture

A device () picks up at least one semi-conductor wafer () from a container () of wafers fitted on one side () of an aperture () in the transfer station () of a semi-conductor wafer processing plant. The device is on the opposite side () of the aperture and the pick-up is effected through it. The device incorporates a shutter () movable between open and closed positions. A wafer picking up means () is attached to the shutter and is designed to enter partially within the container below a wafer and seize the wafer by its edge. A pick up moving means () moves the picking up means () back and forth through the aperture ().

FOUP door transfer system

A mechanical apparatus and method are disclosed for orienting and positioning semiconductor wafers while avoiding contamination of elements on the faces thereof, by only contacting the peripheries thereof. The apparatus may include a frame for wafer supports and a semiconductor wafer gripping arm. The gripping arm is mounted on a translator for movement in X, Y, and Z directions to engage and move wafers in, from, and between supports. The gripping arm comprises a rigid structure with a plurality of semiconductor support wheels mounted thereon to support a wafer only around its periphery. A drive wheel is provided to orient a supported wafer rotationally while it is being supported around its periphery. A detector is provided to detect orientation of the wafer relative to a notch or other position mark on its periphery.

Method and device for changing a semiconductor wafer position

A substrate measurement system including a measurement chamber and a substrate handling chamber possessing a substrate transfer and a substrate container interface arranged to receive a substrate to container. The handling chamber contains a first interface to connect the measurement chamber and the measurement chamber contains a second interface to connect the handling chamber. The transfer means is arranged to transfer substrates between the container and the measurement chamber through the handling chamber, in which system a second measurement chamber is provided, having the same second interface as the first measurement chamber to replace latter chamber.

Modular substrate measurement system

A device and process are provided for identifying characters inscribed on a semiconductor wafer containing an orientation mark. A semiconductor wafer having characters inscribed on a surface near its periphery is supported about its periphery between three rotary supports mounted on a grasping arm. An orientation mark on the periphery of the wafer is located adjacent the inscribed characters. At least one of the three rotary supports is rotatably driven to orient the wafer such that the orientation mark is placed in a determined position. An optical reflector is positioned in a spatial zone in proximity to and above the characters to be identified. The characters to be identified are illuminated by a light beam reflected by the optical reflector. The characters reflect the light, which may be observed by an optical imager, such as a camera. An optical recognition subsystem may then be used to identify the characters.

Apparatus and process for identification of characters inscribed on a semiconductor wafer containing an orientation mark

A mechanical apparatus and method are disclosed for orienting and positioning semiconductor wafers while avoiding contamination of elements on the faces thereof, by only contacting the peripheries thereof. The apparatus may include a frame for wafer supports and a semiconductor wafer gripping arm. The gripping arm is mounted on a translator for movement in X, Y, and Z directions to engage and move wafers in, from, and between supports. The gripping arm comprises a, rigid structure with a plurality of semiconductor support wheels mounted thereon to support a wafer only around its periphery. A drive wheel is provided to orient a supported wafer rotationally while it is being supported around its periphery. A detector is provided to detect orientation of the wafer relative to a notch or other position mark on its periphery.

Substrate measurement system including a measurement chamber ( ), and a substrate handling chamber ( ) possessing substrate transfer means ( ) and a substrate container interface ( ) arranged to receive a substrate container ( ), the handling chamber ( ) containing an interface ( ) to connect the measurement chamber ( ), the measurement chamber ( ) containing an interface ( ) to connect to the handling chamber ( ), and the transfer means ( ) being arranged to transfer substrates between the container ( ) and the measurement chamber ( ) through the handling chamber ( ), in which a second measurement chamber ( ) is provided, having the same interface ( ) as the first measurement chamber ( ) to replace the latter chamber ( ).

Growing community of inventors

Launac, France

Alain Gaudon