Ferrotec Ceramics Corporation

Akishige Sato

Ken Okamoto

Tadahisa Arahori

Sachio Miyashita

Muneaki Sakamoto

Eiji Kusano

A sputtering target which is made of an alumina sintered body having a purity of not less than 99.99% by mass %, a relative density of not less than 98%, and an average grain size of less than 5 &#x3bc;m or is made of an alumina sintered body having a purity of not less than 99.999% by mass % and a relative density of not less than 98%. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.

Sputtering target and method for producing the same

A sputtering target which is made of a magnesium oxide sintered body having a purity of not less than 99.99% or not less than 99.995% by mass %, a relative density of not less than 98%, and an average grain size of not more than 8 &#x3bc;m. The average grain size of the sputtering target is preferably not more than 5 &#x3bc;m, more preferably not more than 2 &#x3bc;m. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.

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Tokyo, Japan

Akishige Sato