Hitachi-high-technologies Corporation

Akira Watabe

Toshie Yaguchi

Yasuhira Nagakubo

Yusuke Ominami

Junzo Azuma

Takeo Kamino

Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere.

Charged particle radiation apparatus, and method for displaying three-dimensional information in charged particle radiation apparatus

The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.

Electron microscope and sample holder

A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

Sample holding apparatus for electron microscope, and electron microscope apparatus

An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.

Growing community of inventors

Higashiibaraki, Japan

Akira Watabe