Hitachi, Ltd.

Other

Research Development Corporation of Japan

Akira Tonomura

Junji Endo

Nobuyuki Osakabe

Masahiro Tomita

Takeshi Kawasaki

Naoki Chinone

Shigeto Isakozawa

Tadashi Fukuzawa

Susumu Ozasa

Nobuo Hamamoto

Setsuo Nomura

Tsuyoshi Matsuda

Akira Fukuhara

Takao Matsumoto

Jun Chen

Shuji Hasegawa

Chikara Kimura

Guanming Lai

Tadao Furutsu

Qing X Ru

Kazuo Ishizuka

An electrostatic potential in a vacuum in the vicinity of a focused electron beam of a direct wave formed on an optical axis of a back focal plane of an objective lens used in an electron microscope can be externally controlled. Therefore, the electrostatic potential is controlled by supplying an electric potential to a ring-shaped electrode from the outside. The outer sides of the electrode are interposed between both of insulators and conductors so as to shield the electrostatic potential against the outer side of a ring, whereby a phase shift is supplied only to an electron beam that passes through the inside of the ring. A phase-contrast electron microscope can be realized which includes a phase plate corresponding to an electron beam, which is capable of observing a phase object with contrast.

Phase-contrast electron microscope and phase plate therefor

An interference device and method for observing phase information, using electron or other waves with the amplitude difficult to split by a half mirror. Using an interference device comprising in combination two scattering films A1 and A2 capable of scattering incident waves randomly, first lens systems B1 and B2 that are located between said two scattering films to form the image of one scattering film A1 on the other scattering film A2, a second lens system B3 for forming on an observation surface C the image of a specimen 2 located at a position where a component going straight through said one scattering film is converged in a spot form through said first lens system or a part thereof, and means for recording an interference pattern formed on the observation surface C, an interference pattern is detected while the specimen 2 is inserted in the arrangement, and an interference pattern is detected while the specimen 2 is removed from the arrangement, so that the difference between both the interference patterns, or the sum or product of them, can be found to observe the phase information of the specimen directly as interference fringes.

Interference device and method for observing phase informalities

A method of and apparatus for efficiently correcting an aberration of an optical system used to record a hologram at the stage of reconstructing an image of the hologram. At the stage of reconstructing an image of a hologram (3), which contains the record of interference fringes formed by a reference plane wave and an object wave modulated by a sample, by applying a plane wave for reconstruction to the hologram (3) from a laser (1), an aberration of an optical system used to record the hologram (3) is canceled by the phase distribution on a liquid crystal panel (6) having a spatial phase modulation function, which is disposed on the Fourier transform plane, thereby correcting the aberration. The phase distribution on the liquid crystal panel (6) can be changed flexibly by a computer (9) in accordance with the aberration coefficients or degree of defocusing of the recording optical system.

Aberration correction method and aberration correction apparatus

In an electron holography apparatus having an electron source, a specimen holder, an electron lens system, and an electron biprism, the electron biprism is so constructed as to be rotatable about the electron optics axis. The rotation angle about the electron optics axis is commanded by the operator of the electron holography apparatus. A central wire of the electron biprism is allowed to be translated in a direction orthogonal to the electron optics axis, thus permitting the application of the fringe scanning method. The center of an aperture is selectively allowed to be aligned with that of the electron biprism to ensure that the measurement apparatus can be used selectively as either the electron holography apparatus or an electron microscope.

Electron optical measurement apparatus

An apparatus forming a reflection electron hologram, wherein a fraction of an electron wave from an electron source illuminate a specimen and caused to be reflected thereat, the remaining electron wave does not illuminate the specimen, but passes aside, the specimen, and the electron wave reflected from the specimen and the electron wave not illuminating, but passes aside, the specimen, are superimposed one upon the other.

Reflection electron holography apparatus

In a field emission electron gun system with a multi-stage acceleration tube comprising a field emission electron source, a field emission electrode for extracting the electrons, a magnetic lens having a magnetic gap between the field emission electron source and the field emission electrode or a magnetic lens having a magnetic pole which also serves as the field emission electrode, and at least two-stages of acceleration electrodes for accelerating the electrons, a magnetization current I for the magnetic lens is changed interlocking with a field emission voltage V.sub.1 applied between the field emission electron source and the field emission electrode so that IN/.sqroot.V.sub.1 (N: the number of windings of the magnetic lens) takes a predetermined value and a first acceleration voltage V.sub.2 applied between the field emission electron source and the first-stage acceleration electrode is changed interlocking with the field emission voltage V.sub.1 so that V.sub.2 /V.sub.1 takes a predetermined value.

Field emission electron gun system

An electron holography apparatus includes an electron microscope which is provided with an electron source, a beam splitter for dividing an electron beam emitted from the electron source into first and second electron beams, and a phase controller for controllably changing a phase difference between the first and second electron beams, and further includes an image detector for detecting an electron interference fringe pattern which varies in accordance with the phase difference between the first and second electron beams, as a picture image, and an image data processor for determining the phase distribution of one of the first and second electron beams from detected image data.

Electron holography apparatus

As a process for fabricating uniform patterns fine enough to produce a quantum size effect, the use of electron halography is proposed. Disclosed examples employing a process are methods of manufacturing a semiconductors laser whose threshold current is approximately 1 mA, and a permeable transistor and bistable device whose response rates are 100 GHz.

Micro fabrication process for semiconductor structure using coherent

A field emission type electron microscope using a multi-stage acceleration tube wherein an acceleration voltage to be applied to at least one, always inclusive of a first-stage acceleration electrode, of acceleration electrodes is changed in interlocked relationship with a change in a field emission voltage to be applied to a field emission electrode, so that power of an electrostatic lens can be kept constant.

Field emission type electron microscope using a multi-stage acceleration

The present invention provides an electron holography microscope producing an interference pattern having contour moire lines which is displayed on a cathode-ray tube. With the invention the three-dimensional structure of a specimen can be readily observed on the cathode-ray tube. The electron holography microscope of the present invention comprises a television camera which picks up the interference pattern a straight line fringe output means for delivering a straight line fringe pattern the direction and interval of which are selected at will. Outputs of the television camera and the means are added in a multiplier and the result is displayed on the cathode-ray tube.

Growing community of inventors

Koganei, Japan

Akira Tonomura