Kao Corporation

Akira Sakaguchi

Tohru Katoh

Yasuki Ohtawa

Kimihiko Hori

Koichi Ishida

Osamu Tachizawa

Junichi Inokoshi

Takeshi Tomifuji

Noriko Yamaguchi

Shuichi Tsuchiya

Tomoko Nomura

Keiko Suzuki

Muneo Aoyagi

Uichiro Nishimoto

Shuji Tagata

Akira Matsunaga

Jun Kono

Kazutaka Shiratsuchi

Ikuo Sugano

Takeshi Shirasawa

Takashi Kitahara

Noriko Sato

Yasuo Amishige

Kaoru Omae

Tomokatsu Kusumi

Kohshiro Sotoya, Deceased

Keiko Koizumi

Hiroyuki Shinta

Yuushi Sakata

Kohshiroh Sotoya, Deceased

The present invention provides a method for producing polyoxyalkylene alkyl ether carboxylic acid and a salt thereof, including supplying polyoxyalkylene alkyl ether, oxygen, and water to a continuous stirred tank reactor containing a noble metal catalyst to oxidize the polyoxyalkylene alkyl ether with oxygen, in which the molar ratio of the salt of polyoxyalkylene alkyl ether carboxylic acid to the polyoxyalkylene alkyl ether in the continuous stirred tank reactor is controlled to 0.33 to 49.

Method for producing polyoxyalkylene alkyl ether carboxylic acid and salt thereof

The invention relates to a method for manufacturing a polyoxyethylene alkyl ether acetic acid, including feeding oxygen into a liquid phase containing polyoxyethylene ether having a hydrocarbon group at the end (hereinafter, it may also be referred to as a polyoxyethylene alkyl ether) and water, and dehydrogenating and oxidizing the polyoxyethylene alkyl ether in the presence of a platinum catalyst, in which the mass ratio between the total mass of the polyoxyethylene alkyl ether and the polyoxyethylene alkyl ether acetic acid and the mass of water in the liquid phase ((polyoxyethylene alkyl ether+polyoxyethylene alkyl ether acetic acid)/water) is 60/40 to 95/5.

Method for manufacturing polyoxyethylene alkyl ether acetic acid

Provided is a process for preparing a sulfuric acid amine salt (I) represented by the formula (I), which is a neutralization compound between a sulfated compound having a long chain alkyl or alkenyl group and an amine having a long chain alkyl or alkenyl group, useful as softener. 

Sulfuric acid amine salt, sulfonic acid amine salt, production thereof and softener composition

A softener composition, which contains tri-long-chain alkyl quaternary ammonium salt that has been considered to be difficult to use as a softener base agent, and which can provide a softener composition that provides a sufficient softening performance, is provided with (A) a cationic surfactant comprising at least one selected from the group consisting of quaternary ammonium salts represented by the formulae (I), (II) or (III), wherein the ratio of quaternary ammonium salt represented by the formula (I) to the total amount of these salts exceeds 50 weight %, with the ratio thereof represented by (III) being set to not more than 10%, and (B) at least one nonionic surfactant. In this case, (A) may include tertiary amine. (wherein, R, Rand Rrepresent long-chain alkyl groups, etc. having total carbon atoms of 8 to 40, which may be intersected by an ether group, an ester group or an amide group; Rrepresents an alkyl group, etc. having carbon atoms of 1 to 6, and Xrepresents an anionic group.)

Softener composition

A softener composition, which contains tri-long-chain alkyl quaternary ammonium salt that has been considered to be difficult to use as a softener base agent, and which can provide a softener composition that provides a sufficient softening performance, is provided with (A) a cationic surfactant comprising at least one selected from the group consisting of quaternary ammonium salts represented by the formulae (I), (II) or (III), wherein the ratio of quaternary ammonium salt represented by the formula (I) to the total amount of these salts exceeds 50 weight %, with the ratio thereof represented by (III) being set to not more than 10%, and (B) at least one nonionic surfactant. In this case, (A) may include tertiary amine.(wherein, R, Rand Rrepresent long-chain alkyl groups, etc. having total carbon atoms of 8 to 40, which may be intersected by an ether group, an ester group or an amide group; Rrepresents an alkyl group, etc. having carbon atoms of 1 to 6, and Xrepresents an anionic group.)

Liquid softener compositions and quaternary ammonium salt

A liquid softener composition comprising a quaternary ammonium salt represented by the general formula (1) and a method for its preparation: ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 are an alkyl group or hydroxyalkyl group of 1 to 4 carbon atoms, R.sup.4 and R.sup.5 are an unsubstituted or hydroxyl group-substituted linear or branched alkyl group or alkenyl group of 8 to 36 carbon atoms, A is a linear or branched alkylene group of 2 or 3 carbon atoms, X is an anion group, n is an integer in the range of 1 to 6, and m is a numeral in the range of 0 to 20.

Quarternary ammonium salt, method for production thereof, and softener

Preparation for external application to the skin and novel benzoic acid

An azole derivative represented by the following formula (I): ##STR1## wherein X is a nitrogen atom or CH, Y is an oxygen atom, a sulfur atom, an imino group, a methylimino group or a group represented by .dbd.N.about.O--, Z is one or two halogen atoms, n stands for a number of 1 or 2, the wavy line means that stereochemistry of the double bond is either E or Z; or an acid adduct thereof. They exhibit strong antifungal activities and are very useful in the therapy for fungus diseases. Also disclosed is an antifungal drug containing said compound as an active ingredient.

Azole derivatives and antifungal drugs containing the same as an active

An azole derivative represented by the following formula (I): ##STR1## wherein X is a nitrogen atom or CH, Y is an oxygen atom, a sulfur atom, an imino group, a methylimino group or a group represented by .dbd.N O--, Z is one or two halogen atoms, in stands for a number of 1 to 2, the wavy line means that stereochemistry of the double bond is either E or Z; or an acid adduct thereof. They exhibit strong antifungal activities and are very useful in the therapy for fungus diseases. Also disclosed is an antifungal drug containing said compound as an active ingredient.

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Wakayama, Japan

Akira Sakaguchi