Fuji Photo Film Company, Limited

Akira Nishioka

Hiroshi Takahashi

Shiro Tan

Yoshimasa Aotani

Kotaro Yamasue

Fumiaki Shinozaki

Takao Nakayama

Tadahiro Sorori

Hirokazu Sakaki

Tamotsu Suzuki

Keiji Akiyama

Mikio Totsuka

Nobuyoshi Kaneko

Masayuki Kamei

Kazuo Fujita

Haruo Nakanishi

Tomoaki Takekoshi

Koichiro Aono

Toshihiko Umaba

Yoshikatsu Kagawa

Fumihiro Tokunaga

Toshimi Hirano

A lithographic printing plate precursor comprises: a support; and an image-forming layer including a fluoroaliphatic group-containing copolymer, wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to monomer (i) below and a repeating unit corresponding to monomer (ii) below:

Lithographic printing plate precursor

A lithographic printing plate precursor comprises: a support; and an image-forming layer including a copolymer containing a specific fluoroaliphatic group and a repeating unit corresponding to at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.

A photosensitive composition comprising (A) an ethylenically unsaturated addition-polymerizable compound, (B) an aqueous alkali-soluble or swelling polymer which is capable of forming a film, (C) a photopolymerization initiator, (D) a negative-working diazo resin, and (E) a component which is soluble in a photosensitive solution, but floats on a surface of a photosensitive layer and is capable of forming an oxygen-intercepting layer during coating and drying is described. A photosensitive lithographic printing plate comprising a support coated with the above-described photosensitive composition and a matting layer provided thereon, wherein the surface of the matting layer has a micro pattern comprising (i) a portion which is coated with a composition comprising a copolymer containing at least one monomer unit having a sulfonic acid group and (ii) a portion which is uncoated with the composition is also descried.

Photosensitive composition and photosensitive lithographic printing plate

A method for manufacturing a substrate for presensitized plates for use in making lithographic printing plates comprises the steps of electrolytically surface-roughening an aluminum plate or an aluminum alloy plate in a nitric acid-containing electrolyte and then etching the surface with an alkali or an acid to thus form irregularity in the order of not more than 0.1 .mu.m within pits formed on the surface during the electrolytic surface roughening treatment. The method makes it possible to provide a lithographic printing plate stably and simultaneously having excellent printing durability and good resistance to background contamination of non-image areas.

Method for manufacturing substrates for ps plates

A positive-working light-sensitive composition is herein disclosed, which comprises a mixed organic solvent consisting of (i) at least one organic solvent having a boiling point of at least 40.degree. C. and less than 100.degree. C., (ii) at least one organic solvent having a boiling point of at least 100.degree. C. and less than 140.degree. C., and (iii) at least one organic solvent having a boiling point of at least 140.degree. C. and less than 210.degree. C.; or (a) at least one organic solvent as defined in the above item (i), (b) at least one organic solvent as defined in the item (ii), (c) at least one organic solvent having a boiling point of at least 210.degree. C., and optionally at least one solvent as defined in the item (iii), based on the total weight of the mixed solvent, the composition making it possible to extremely reduce load for drying and to impart excellent properties such as development latitude to the resultant light-sensitive layer and the composition being useful to produce PS plates according to a continuous process.

Light-sensitive positive working, o-guinone diazide presensitized plate

A light-sensitive composition for use in making a light-sensitive layer of, for instance, a presensitized plate from which a lithographic printing plate is to be prepared, which comprises a fluorine-containing surfactant and is characterized in that the fluorine-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group, Rf, which has 3 to 20 carbon atoms and at least 40% by weight of fluorine atoms and at least three terminal carbon atoms of which are fully fluorinated; and (ii) a poly(oxyalkylene) (meth)acrylate and that Rf group-containing (meth)acrylate monomer unit is present in the copolymer in an amount of from 25 to 70% by weight based on the total weight of the copolymer. The composition provides a light-sensitive layer of a uniform thickness and it provides a lithographic printing plate having acceptable and excellent properties.

Light-sensitive composition with fluorine containing acrylate or

A light-sensitive image-forming material which has on a support a coloring layer comprising a coloring agent and an alkali soluble organic macromolecular binder, and a photopolymer layer, in the order listed, with the coloring layer further containing a particular fluorine-containing surface active agent, whereby uniform film thickness is ensured to the coloring layer even when drying is carried out in a short time using simple equipment. The fluorine-containing surface active agent is a copolymer comprising as repeating units (1) an acrylate or a methacrylate which has a fluorinated alphatic group containing from 3 to 20 carbon atoms and not less than 40 wt % of fluorine atoms, with the aliphatic group having a terminal moiety containing at least 3 fluorinated carbon atoms, and (2) a poly(oxyalkylene)acrylate or a poly(oxyalkylene)methacrylate. In addition, the portion of the fluorinated aliphatic group-containing acrylate or methacrylate repeating unit is from 10 to 70% by weight.

Light sensitive alkali developable photoresist material with fluorine

A light-sensitive printing plate precursor is described comprising a support having provided thereon a light-sensitive layer, said light-sensitive layer having spray-coated and dried thereon an aqueous liquid containing a resin in a dissolved or dispersed state.

Light-sensitive printing plate precursor

A negative working light-sensitive composition and a lithographic printing plate using the composition are described. The printing plate is comprised of a hydrophilic support and a thin layer of a negative working light-sensitive composition on the support. The light-sensitive composition contains a light-sensitive diazo compound and a compound capable of increasing absorption over the light-sensitive wavelength region of the composition with increasing exposure time.

Negative working diazo light-sensitive composition with oxonol dye and

A light-sensitive printing plate precursor is disclosed. The printing plate precursor is comprised of an aluminum support base having provided on a grained and anodized surface. The surface is coated with a layer which is comprised of a positive working light-sensitive composition and an oxonol dye. The printing plate has high printing durability, high water retention ability and high color stain resistance. When used the plate precursor provides an image having high contrast. The plate precursor forms less color stain than conventional plates whether used with a fresh developing solution or a fatigued developing solution. The plate precursor does not result in causing uneven development when using manual development methods.

Light-sensitive o-quinonediazide printing plate with oxonol dye

A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the exposed plate with a developer, comprising an aqueous solution of an alkali metal silicate, adding a supplementary solution comprising an aqueous solution of an alkali metal silicate to the developer to compensate for the degradation of the developer brought about by development and/or by carbon dioxide in the air; wherein the developer comprises an aqueous solution of an alkali metal salt having an [SiO.sub.2 ]/[M] ratio of from 0.5 to 0.75 and an SiO.sub.2 concentration of from 1 to 4% by weight based on the total weight of the developer, where [SiO.sub.2 ] represents the concentration of SiO.sub.2 per unit volume expressed as gram-molecules, and [M] represents the concentration of the alkali metal per unit volume expressed as gram-atoms, and the supplementary solution comprises an aqueous solution of an alkali metal silicate having an [SiO.sub.2 ]/[M] ratio of from 0.25 to 0.75.

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Shizuoka, Japan

Akira Nishioka