Kobe Steel, Ltd.

Kobelco Research Institute, Inc.

Akira Nanbu

Hiroshi Goto

Junichi Nakai

Katsutoshi Takagi

Aya Miki

Nobuyuki Kawakami

Mototaka Ochi

Hiroyuki Okuno

Yuki Iwasaki

Masaya Ehira

Disclosed is an Al alloy film for a display device that, even when low-temperature heat treatment is applied, can realize satisfactorily low electric resistance, can realize a satisfactory reduction in contact resistance between the Al alloy film and a transparent pixel electrode connected directly to the Al alloy film, and has excellent corrosion resistance. The Al alloy film is connected directly to a transparent electroconductive film on the substrate in the display device. The Al alloy film comprises 0.05 to 0.5 atomic % of Co and 0.2 to 1.0 atomic % of Ge and satisfies the requirement that the content of Co and the content of Ge in the Al alloy film have a relationship represented by formula (1): [Ge]&#x2267;&#x2212;0.25&#xd7;[Co]+0.2 (1) In formula (1), [Ge] represents the content of Ge in the Al alloy film, atomic %; and [Co] represents the content of Co in the Al alloy film, atomic %.

Al alloy film for display device, display device, and sputtering target

The present invention relates to an Al&#x2014;Ni&#x2014;La&#x2014;Si system Al-based alloy sputtering target including Ni, La and Si, in which, when a section from (&#xbc;)t to (&#xbe;)t (t: thickness) in a cross section vertical to a plane of the sputtering target is observed with a scanning electron microscope at a magnification of 2000 times, (1) a total area of an Al&#x2014;Ni system intermetallic compound having an average particle diameter of 0.3 &#x3bc;m to 3 &#x3bc;m with respect to a total area of the entire Al&#x2014;Ni system intermetallic compound is 70% or more in terms of an area fraction, the Al&#x2014;Ni system intermetallic compound being mainly composed of Al and Ni; and (2) a total area of an Al&#x2014;Ni&#x2014;La&#x2014;Si system intermetallic compound having an average particle diameter of 0.2 &#x3bc;m to 2 &#x3bc;m with respect to a total area of the entire Al&#x2014;Ni&#x2014;La&#x2014;Si system intermetallic compound is 70% or more in terms of an area fraction, the Al&#x2014;Ni&#x2014;La&#x2014;Si system intermetallic compound being mainly composed of Al, Ni, La, and Si.

Al-Ni-La-Si system Al-based alloy sputtering target and process for producing the same

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Kobe, Japan

Akira Nanbu