Sumitomo Electric Industries, Limited

Akira Nakayama

Nobuhiko Fujita

Makoto Setoyama

Mitsunori Kobayashi

Kazuo Yamagata

Motoyuki Tanaka

Yasuhisa Hashimoto

Hideo Itozaki

Nozomu Kawabe

Yoshinobu Takeda

Tadashi Tomikawa

Takashi Uemura

Kouichi Sogabe

Takashi Yoshioka

Syoji Nakagama

Naohiro Toda

Shousaku Yamanaka

Shyoji Nakagama

Takashi Yoshida

A hydrogen storage laminated material can be obtained which is capable of achieving reduction in weight as well as being mass-produced industrially while assuring excellent hydrogen storage capability. The hydrogen storage laminated material ( ) has a laminated structure of a first layer ( ) and a second layer ( ), wherein the first layer is formed from an alloy or compound including an element of a group A or A or an element of at least one of the groups A and A, and at least partially includes a bcc structure, and the second layer is formed from an alloy or compound including an element of one of groups A, A and A or an element of at least one of the groups A, A and A.

Hydrogen-occluding layered material

A coating film which can sufficiently improve the wear resistance of a cutting tool or a wear-resistant tool and which reveals excellent qualities as a wear-resistant or protective film for an electric or electronic part or a sliding or machine part. Such a coating film is in the form of an ultra-thin film laminate comprising at least one nitride or carbonitride of at least one element selected from the group consisting of the elements in the groups IVa, Va and VIa in the periodic table and Al and B and having a cubic crystal structure and having mainly metallic bonding properties, and at least one compound having a crystal structure other than the cubic crystal structure at normal temperature and normal pressure and under equilibrium state and having mainly covalent bonding properties, the at least one nitride or carbonitride and the compound being alternately laminated in the form of layers, each layer of the compound having a thickness of 0.2-50 nm, the laminate having a cubic crystalline X-ray diffraction pattern as a whole.

Ultra-thin film laminate

There can be provided a novel and useful process for the synthesis of hard boron nitride consisting essentially of single phase cubic boron nitride by a gaseous phase synthesis technique, which comprises adding a F atom-containing gas to the gaseous phase or adding a F atom-containing gas and H atom-containing gas to the gaseous phase, whereby the codeposited hexagonal boron nitride can selectively be etched and hard boron nitride of substantially single phase can finally be synthesized.

Process for the synthesis of hard boron nitride

A highly pure cubic boron nitride film is formed on a substrate by a method which comprises irradiating an excimer laser on a target comprising boron atoms and optionally nitrogen atom and depositing cubic boron nitride on a substrate which is placed to face the target.

Production of cubic boron nitride films by laser deposition

Growing community of inventors

Itami, Japan

Akira Nakayama