Tokyo Electron Limited

Akira Murata

Issei Ueda

Katsuhiro Morikawa

Satoshi Kaneko

Suguru Enokida

Osamu Kuroda

Yuichi Douki

Michiaki Matsushita

Junya Minamida

Masahiro Yoshida

Kazuki Motomatsu

Kouji Kimoto

Kazunori Sakamoto

Minoru Tashiro

Akihiro Matsumoto

A substrate storage apparatus includes a stage on which a cassette that has a lid detachably mounted to an opening is disposed, a lid attaching/detaching plate that performs attaching/detaching of the lid to/from the opening of the cassette disposed on the stage, and is provided to be movable between a mounting position in contact with the lid disposed at a position of the opening and a retracted position not in contact with the lid disposed at the position of the opening, a lid holding sensor that detects whether the lid is being held by the lid attaching/detaching plate, and a controller that determines presence/absence of abnormality related to attachment/detachment of the lid based on a detection result of the lid holding sensor.

Substrate storage apparatus, substrate storage method, and recording medium

A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatusincludes a processing chamberhaving a processing spacein which a substrate W is processed; a vaporizing tank, configured to store the processing liquid therein, having a vaporization spacein which the stored processing liquid is allowed to be vaporized; a decompression driving unitconfigured to decompress the vaporization space; and a control unit. The control unitvaporizes the processing liquid into the processing gas by decompressing the vaporization spacewithout through the processing space, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization spacethrough the processing space, and supplies an inert gas into the vaporization space

Substrate processing apparatus, substrate processing method and recording medium

A throughput can be improved. A substrate processing apparatus includes processing units arranged in a vertical direction and configured to process substrates; and a substrate transfer device configured to be moved in the vertical direction and perform loading/unloading of the substrates into/from the processing units. Further, the substrate transfer device comprises a first transfer arm and a second transfer arm which are arranged in the vertical direction and configured to be moved in the vertical direction independently, and movement ranges of the first transfer arm and the second transfer arm in the vertical direction are overlapped with each other.

Substrate processing apparatus

A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit. Further, the control device includes a transfer control unit configured to control the substrate transfer unit to accommodate the substrate at a predetermined target accommodation position; a determination unit configured to determine an actual accommodation position for the substrate based on a detection result of the detection unit after the detection unit detects the substrate accommodated in the cassette; and a correction unit configured to correct a predetermined target accommodation position as an accommodation position for another substrate based on a difference between the actual accommodation position and the target accommodation position for the substrate.

Substrate transfer device, substrate processing apparatus, and substrate accommodation method

A substrate processing apparatus includes a substrate transit table configured to mount thereon a plurality of substrates; a substrate processing chamber configured to process the substrate one by one; a substrate transfer device capable of loading the substrate into the substrate processing chamber from the substrate transit table and unloading the substrate from the substrate processing chamber to the substrate transit table; and N number of (N is an integer equal to or larger than 3) substrate holding devices provided at the substrate transfer device and configured to hold the substrates one by one. Here, a multiplicity of (2 to N&#x2212;1 number of) substrates are concurrently held by 2 to N&#x2212;1 number of substrate holding devices among the N number of substrate holding devices and one substrate is loaded into the substrate processing chamber.

Substrate processing apparatus, substrate processing method and storage medium storing substrate processing program

Disclosed is a gas treatment apparatus which can reduce the useless liquid quantity without using an expensive device, such as the evaporator or the mass flowmeter. The control mechanism performs control for exhausting the raw material storage container to make the raw material storage container have a predetermined vacuum pressure, stopping exhaustion to make the raw material storage container be in a sealed state, making the inside of the raw material storage container have the treatment gas atmosphere formed by gasifying the liquid raw material by the vacuum pressure within the raw material storage container, exhausting the chamber to make the chamber have a predetermined vacuum pressure in a state where the target substrate is received in the chamber, stopping the exhaustion to make the inside of the chamber be in a sealed state, opening the opening/closing valve to introduce the treatment gas from the raw material storage container to the chamber, and closing the opening/closing valve when the inside pressure of the chamber reaches a treatment pressure that is higher than the vacuum pressure and lower than a vapor pressure of the liquid raw material to make the chamber have the treatment gas atmosphere of the treatment pressure.

Gas treatment apparatus, gas treatment method, and storage medium

A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.

Growing community of inventors

Koshi, Japan

Akira Murata