Sumitomo Chemical Company, Limited

Akira Morisaki

Yutaka Shiomi

Yasuhiro Miura

Masao Morikawa

Yasuyoshi Sawaguri

Yoji Matsuda

Impurities are removed from aqueous hydrogen peroxide by treating the aqueous hydrogen peroxide by reverse osmosis, cation-exchanging the aqueous hydrogen peroxide and anion-exchanging the aqueous hydrogen peroxide, and the treated ultra-pure hydrogen peroxide can be used in the electronics industries.

Apparatus and method for removing impurities from aqueous hydrogen

Process for producing high-purity sulfuric acid

The present invention provides a method of measuring particles and an apparatus for the same, which count only particles in liquid by distinguishing between the particles and bubbles in liquid. In order to fulfill the above requirements, in the present invention, liquid to be measured flows through a flow cell at a fixed flow rate, and a laser beam is irradiated thereto. Scattering light is generated when particles and bubbles pass through a laser beam irradiation region, and the scattering light is converted into a pulse signal by a photoelectric converter. In the pulse signals, a pulse signal having a pulse width of 100 .mu.S is regarded as corresponding to light scattered by a bubble, which is omitted from the number of pulse signals. Thus, only a pulse signal corresponding to light scattered by a particle in liquid can be measured.

Method of measuring particles and apparatus for the same

Growing community of inventors

Sodegaura, Japan

Akira Morisaki