Canon Kabushiki Kaisha

Astellas Pharma Gmbh

Yamanouchi Pharmaceutical Company Ltd.

Obayashi Corporation

Akira Miyake

Fumitaro Masaki

Mitsuaki Amemiya

Yutaka Watanabe

Shinobu Mochizuki

Masami Tsukamoto

Naoya Iizuka

Hiromichi Yokoi

Takeshi Yamamoto

Masato Muraki

Ichiro Tanaka

Takeo Tsukamoto

Osamu Tsujii

Takeshi Suzuki

Yasuaki Fukuda

Takayuki Hasegawa

Takeshi Miyachi

Nobuaki Ogushi

Ichiro Nomura

Masahiko Okunuki

Shigeru Terashima

Shin Matsui

Hiromitsu Takase

Kohei Inamura

Yorikata Sano

Hideyuki Chinju

Hideo Kato

Jun Ito

Nobuo Kushibiki

Hiroshi Maehara

Keiko Chiba

Yoshikiyo Yui

Hideki Kubota

Masami Yonekawa

Masanori Miura

Hajime Kanazawa

Masami Hayashida

Takahiro Nakayama

Eiichi Nakai

Kentaro Sano

Masashi Kotoku

Katsura Nozawa

Kiyoshi Yahiro

Seiken Matsumoto

Nobuaki Ohgushi

Nobuaki Oqushi

Jianwei Ni

Yasuyuki Miyagawa

Kou Muraoka

Masahiko Honma

Yukihiro Nakamura

Kazuhiro Nakatou

The present invention provides an exposure apparatus for exposing a shot on a substrate to first pulsed light, the apparatus including an optical element for guiding the first pulsed light to the substrate, an irradiation device configured to irradiate the optical element with second pulsed light having an infrared wavelength which the first pulsed light has less than the second pulsed light has, and a controller configured to control the irradiation device in a process of exposing the shot to the first pulsed light plural times, such that the irradiation device irradiates the optical element with the second pulsed light during at least one period of non-irradiation periods in which the shot is not irradiated with the first pulsed light.

Exposure apparatus with irradiation device for irradiating optical element with pulsed light having infrared wavelength, and corresponding exposure method

A reflective original includes: a reflection layer which has a multilayer film configured to reflect extreme ultraviolet light; a base material configured to support the reflection layer; and a thermal diffusion layer interposed between the reflection layer and the base material, and configured to diffuse heat of the reflection layer. A heat capacity, per unit area, of a structure constituted by both the reflection layer and the thermal diffusion layer is not lower than 1.1 (J/(K&#xb7;m)).

Reflective original, exposure method, and device manufacturing method

A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method

An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

X-ray apparatus and its adjusting method

A radiation imaging apparatus according to the present invention includes a radiation source, a reflective structure where at least three reflective substrates are arranged with an interval and radiations being incident into a plurality of passages whose both sides are put between the reflective substrate are reflected and parallelized by the reflective substrate at both sides of the passage to be emitted from the passage, a radiation detector, and an image construction unit that constructs an image of an object based on an intensity of the radiation which is emitted from each of the passages, transmits the object and is detected by the radiation detector. When one edge of the reflective structure is an inlet of the radiation and the other edge is an outlet of the radiation, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet.

Radiation imaging apparatus

The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.

X-ray optical apparatus

The present invention provides a method of adjusting an X-ray optical apparatus which includes: an X-ray source; and a reflective structure where at least three reflective substrate arranged with an interval and X-rays which are incident into a plurality of passages whose both sides are put between the reflective substrates are reflected and parallelized by the reflective substrate at both sides of each passage to be emitted from the passage. When one edge of the reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet side is larger than a pitch at the inlet side. The method comprises adjusting the relative positions of the X-ray source and the reflective structure so as to reduce a penumbra amount formed by the X-ray emitted from each of the passages.

X-ray optical apparatus and adjusting method thereof

A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing.

Charged particle beam apparatus, and article manufacturing method

A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

In situ cleaning device for lithographic apparatus

A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

Filter, exposure apparatus, and method of manufacturing device

An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged.

Optical device and device manufacturing method

The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Charged particle optical system, drawing apparatus, and method of manufacturing article

The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.

Charged particle beam drawing apparatus and article manufacturing method

A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.

Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method

A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.

Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method

Growing community of inventors

Nasukarasuyama, Japan

Akira Miyake