Ntt Advanced Technology Corporation

Akira Kodaira

Takashi Maruyama

Satoshi Oku

A substrate () is etched by etching processing with crystal anisotropy, thereby forming a recess () from the main surface of the substrate () to the inside of the substrate (). A side surface () is almost a (111) plane, and the etching hardly progresses. As a result, a cross section of the recess () perpendicular to the longitudinal direction has a rectangular shape. Since an opening () of a mask pattern () has a rectangular shape in a planar view, the opening of the recess () has a rectangular shape in a planar view, and the recess () is formed into, for example, a rectangular parallelepiped shape. The recess () includes a side surface () that forms one plane perpendicular to the main surface of the substrate (). The side surface () is a facet surface and is a tilting surface tilted from the (111) plane.

Growing community of inventors

Tokyo, Japan

Akira Kodaira