Sumitomo Chemical Company, Limited

Akira Kamabuchi

Koji Ichikawa

Yasunori Uetani

Yuichi Mukai

Airi Yamada

Hyungjoo Kim

Naoki Takeyama

Jun Tomioka

Masahiko Shimada

Haruyoshi Osaki

Takashi Nishimura

Hiroshi Moriuma

Takayuki Miyagawa

Takahiro Yasue

Mitsuyoshi Ochiai

Junji Shigematsu

Kaoru Araki

Yuko Yamashita

Koshiro Ochiai

Kunishige Edamatsu

Kenji Oohashi

A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I'): wherein R, R, Rand Rindependently each represent a C1-C8 alkyl group, and Arepresents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

Photoresist composition

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, when Xis &#x2014;O&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;N(R)&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;CO&#x2014;X&#x2014; or *&#x2014;X&#x2014;N(R)&#x2014;CO&#x2014;X&#x2014;, when Xis &#x2014;N(R)&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;CO&#x2014; or *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;CO&#x2014;, Xand Xindependently each represent a C1-C6 divalent aliphatic hydrocarbon group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

Resin and photoresist composition comprising the same

A resin comprises a structural unit derived from a compound represented by the formula (I); wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that optionally has one or more halogen atoms; Xrepresents a Cto Cheterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a Cto Chydrocarbon group, a Cto Calkoxyl group, a Cto Cacyl group, or a Cto Cacyloxy group, and one or more &#x2014;CH&#x2014; contained in the heterocyclic group may be replaced by &#x2014;CO&#x2014; or &#x2014;O&#x2014;.

Resin, resist composition and method for producing resist pattern

A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), 

Resist composition and method for producing resist pattern

The present invention provides a compound represented by the formula (I): wherein Rrepresents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, Arepresents a divalent connecting group, Xrepresents a C2-C36 heterocyclic group and one or more &#x2014;CH&#x2014; in the C2-C36 heterocyclic group can be replaced by &#x2014;CO&#x2014; or &#x2014;O&#x2014;, Ris independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.

Compound, resin and photoresist composition

A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator. 

A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator, 

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Zrepresents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1):-AX-AX-A-&#x2003;&#x2003;(a-1)wherein Xand Xeach independently represents &#x2014;O&#x2014;, &#x2014;NH&#x2014;, &#x2014;CO&#x2014;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;, &#x2014;CO&#x2014;NH&#x2014; or &#x2014;NH&#x2014;CO&#x2014;, A, Aand Aeach independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Zrepresents a single bond or &#x2014;CO&#x2014;.

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, ring Xrepresents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having &#x2014;COO&#x2014; and k represents an integer of 1 to 4, wherein Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group, and

Chemically amplified positive resist composition

The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and

Chemical amplification type resist composition

The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

The present invention provides a sulfonate of the formula (I'): wherein Q, Q, Q, Qand Qeach independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, or electron attractive group, with the proviso that at least one of Q, Q, Q, Qand Qrepresents alkyl having 3 to 16 carbon atoms or alkoxy having 3 to 16 carbon atoms, and at least one of Q, Q, Q, Qand Qis electron attractive group; and The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) wherein Arepresents counter ion, and Q, Q, Q, Qand Qare as defined above; and

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Ashiya, Japan

Akira Kamabuchi