Agc Inc.

Nec Corporation

Sony Corporation

Asahi Glass Company, Limited

Akira Isobe

Taiki Hoshino

Kenji Ishizeki

Kiyotaka Takao

Kazue Toda

Eisuke Murotani

Tsutomu Anzai

Hiroyuki Hara

Daisuke Shirakawa

Takashige Yoneda

Keisuke Abe

Minako Shimada

Daisuke Jomuta

Nobuyuki Otozawa

Yuuichi Oomori

Reika Fukuda

Yohei Kawai

Yuki Hatanaka

Tomotake Morita

Yukiko Shiota

A fluorinated ether compound is represented by formula: [XRSi—R—]C—R—[N(R)C(O)]—(RO)-Q-[C(O)N(R)]—R—C[—R—SiRX]. Ris a fluoroalkylene group having no branched structure, Qis a fluoroalkylene group having no branched structure, Ris a hydrogen atom or an alkyl group, Ris a single bond, an alkylene group, an alkylene group comprising an etheric oxygen atom at its terminal on the side bonded to [XRSi—R—]C, an alkylene group with at least two carbon atoms comprising an etheric oxygen atom between its carbon-carbon atoms, or an alkylene group with at least two carbon atoms comprising an etheric oxygen atom between its carbon-carbon atoms and at its terminal on the side bonded to [XRSi—R—]C, Ris an alkylene group, or the like, Ris a hydrogen atom or a monovalent hydrocarbon group, and Xis a hydrolyzable group.

Fluorinated ether compound, fluorinated ether composition, coating liquid and article

To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid that are able to form a surface layer which is excellent in water/oil repellency, abrasion resistance, fingerprint stain removability, lubricity and outer appearance, and an article having such a surface layer. A fluorinated ether compound represented by A-O—(RO)Q-[C(O)N(R)]—R—C[—R—SiRX], wherein Ais a Cperfluoroalkyl group; Ris a fluoroalkylene group having no branched structure; m1 is an integer from 2 to 210; Qis a single bond or a fluoroalkylene group having no branched structure; Ris a hydrogen atom, etc.; p1 is 0 or 1; Ris a single bond, an alkylene group, etc.; Ris an alkylene group, etc.; Ris a monovalent hydrocarbon group, etc.; Xis a hydrolyzable group; and n1 is an integer of from 0 to 2.

To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid that are able to form a surface layer which is excellent in water/oil repellency, abrasion resistance, fingerprint stain removability, lubricity and outer appearance, and an article having such a surface layer. A fluorinated ether compound represented by A-O&#x2014;(RO)-Q-[C(O)N(R)]&#x2014;R&#x2014;C[&#x2014;R&#x2014;SiRX], wherein Ais a Cperfluoroalkyl group; Ris a fluoroalkylene group having no branched structure; m1 is an integer from 2 to 210; Qis a single bond or a fluoroalkylene group having no branched structure; Ris a hydrogen atom, etc.; p1 is 0 or 1; Ris a single bond, an alkylene group, etc.; Ris an alkylene group, etc.; Ris a monovalent hydrocarbon group, etc.; Xis a hydrolyzable group; and n1 is an integer of from 0 to 2.

To provide a water/oil repellent article which presents little burden on the environment, while being excellent in water/oil repellency, washing durability of the water repellency and friction durability of the water repellency; a method for producing such a water/oil repellent article; and a water/oil repellent composition and a water/oil repellent kit to be used for producing such a water/oil repellent article. A water/oil repellent article that comprises a substrate and, as adhered to the surface of the substrate, a fluorinated polymer having structural units based on monomer (a) having a Cperfluoroalkyl group, and a specific fluorinated ether compound; a method for producing the water/oil repellent article, which comprises letting the fluorinated polymer and fluorinated ether compound be adhered to the substrate; a water/oil repellent composition which comprises the fluorinated polymer and fluorinated ether compound; and a water/oil repellent kit which comprises a first container accommodating a first liquid containing the fluorinated polymer and a second container accommodating a second liquid containing the fluorinated ether compound.

Water/oil repellent article, method for its production and water/oil repellent composition

To provide a water/oil repellent composition whereby it is possible to obtain an article which is excellent in each of water repellency, oil repellency and heavy rain durability, a method for its production, and an article which is excellent in each of water repellency, oil repellency, heavy rain durability and texture. The water/oil repellent composition comprises a copolymer containing structural units based on a monomer (a), structural units based on a monomer (b) and structural units based on a monomer (c). Here, the monomer (a) is a compound represented by (Z&#x2014;Y)X (wherein Z is a Cperfluoroalkyl group, etc.; Y is a bivalent organic group, etc.; n is 1 or 2; and X is a polymerizable unsaturated group). The monomer (b) is a (meth)acrylate having no polyfluoroalkyl group and having an alkyl group with at least 12 carbon atoms. The monomer (c) is a monomer having a poly(oxypolyfluoroalkylene) chain.

Water/oil repellent composition, method for its production, and article

The present invention provides a substrate with an antireflection layer not only which is excellent in the antireflection properties but also which has high water repellency and oil repellency and favorable oil and fat stain removability, and a display device provided with a substrate with an antireflection layer. A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate,

Substrate with antireflection layer

To provide a fluorinated ether composition useful for surface treatment to impart water/oil repellency to the surface of a substrate, a method for producing the fluorinated ether composition, and a coating liquid containing the fluorinated ether composition, as well as a substrate having a surface-treated layer, and a method for producing the same. Said composition comprises at least two fluorinated ether compounds which are represented by A-O-Q-(CFO)&#x2014;X&#x2014;O&#x2014;Band which are different in B. X is a divalent organic group having no CFO. Bis &#x2014;CHCHCHSiLR, &#x2014;CHCH(SiLR)CH, &#x2014;CHCH&#x2550;CHor &#x2014;CH&#x2550;CHCH. A is a perfluoroalkyl group or group B. Of the total of group Bin said composition, the proportion of &#x2014;CHCHCHSiLRis from 90 to 99 mol %, and the proportion of &#x2014;CH&#x2550;CHCHis from 1 to 10 mol %. L is a hydrolyzable group, and R is a monovalent hydrocarbon group. b is an integer of from 1 to 10, and d is an integer of from 1 to 200.

Fluorinated ether composition, method for its production, coating liquid, substrate having surface-treated layer and method for its production

To provide a method for producing a silicon compound, whereby a hydrosilylation reaction of a compound having a 2-propenyl group, can be conducted with high selectivity by a simple and easy method. The method for producing a silicon compound comprises reacting a compound (3) having a group represented by &#x2014;CHCH&#x2550;CHand a silicon compound (4) having an H&#x2014;Si bond in the presence of a transition metal catalyst (C) and a compound (D) having a group represented by &#x2014;S(&#x2550;O)&#x2014; to obtain a compound (5) having a group represented by &#x2014;CHCHCHSi&#x2261;.

Method for producing silicon compound

To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid, whereby it is possible to form a surface-treated layer which has high initial water/oil repellency and which is excellent in abrasion resistance and fingerprint stain removability, and a substrate having a surface-treated layer and a method for its production. A fluorinated ether compound which has a poly(oxyperfluoroalkylene) chain (&#x3b1;&#x3b2;) having a Coxyperfluoroalkylene unit (&#x3b1;) and an oxyperfluoroalkylene unit (&#x3b2;) other than the unit (&#x3b1;) and which has a hydrolysable silyl group on at least one terminal of the poly(oxyperfluoroalkylene) chain (&#x3b1;&#x3b2;) via a linking group.

Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface-treated layer and method for its production

To provide a fluorinated polyether compound capable of forming a film excellent in lubricity, a lubricant and a liquid composition, as well as an article having a film excellent in lubricity, on a substrate. A fluorinated polyether compound represented by {X&#x2014;O&#x2014;[(CFCFO)&#x2014;(CFCFCFCFO)]}&#x2014;Y&#x2014;{[(OCFCF)&#x2014;(OCFCFCFCF)]&#x2014;O&#x2014;Z}is used. X is a group having a hydroxy group, a carboxy group, an ester group or an aryl group, Y is an (m+n) valent linking group, Z is a group having a haloalkyl group, each of m and n is an integer of from 1 to 10, m+n is an integer of from 2 to 20, and each of a, b, c and d is an integer of from 1 to 100.

Fluorinated polyether compound, lubricant, liquid composition and article

A polishing apparatus has a retainer for retaining a semiconductor wafer on a polishing pad, and the outer periphery of the retainer ring is rounded so as to minimize a deformation produced in the polishing pad, thereby improving the surface profile of the semiconductor wafer.

Polishing apparatus having retainer ring rounded along outer periphery

A test line (12) is formed between a pair of current sypplying terminals (11). A step pattern (14) composed of polysilicon or the like is formed below the test line (12) through an inter-layer insulation film. One of two sides of the step pattern (14) that extends along the longitudinal direction of the test line (12) is positioned therebelow so as to form a step extending in a direction of the test line. Thus, since electromigration tends to easily take place, the deterioration of the semiconductor device can be precisely evaluated.

Structure for wiring reliability evaluation test and semiconductor

A polishing apparatus is equipped with a wafer holder and a pad conditioner concurrently changed to working position over a polishing pad, and the polishing pad grinds the semiconductor wafer under concurrent cleaning operation thereon so as to enhance the throughput of the polishing apparatus: grooves are formed in a wafer carrier of the wafer holder for sufficiently supplying polishing slurry to the semiconductor wafer, and a guide wall is provided over the polishing pad so as to cause the polishing slurry to partly return to a central area of the polishing pad.

Growing community of inventors

Tokyo, Japan

Akira Isobe