Ykk Corporation

Hirata Corporation

Bio Medical Science, Inc.

Ntt Docomo, Inc.

Akira Ishii

Yuki Inoue

Seigo Murakami

Tomoyuki Matsumoto

Naoki Nishiguchi

Nobuyuki Nakagawa

Ayako Endo

Koichi Osawa

A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. Reach independently represents a monovalent hydrocarbon group or a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group, and at least one Ris a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group when p is 1 and when p is an integer of 2 or more and all of Z is an oxygen atom. Rand Reach independently represent a divalent hydrocarbon group, and Rrepresents a glycoluril ring structure or an isocyanul ring structure.

Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product

Sample crushing and pulverizing apparatus

Growing community of inventors

Tokyo, Japan

Akira Ishii