Adv Antest Corporation

Akira Goishi

Koshi Ueda

Masayuki Kuribara

Masayuki Kurihara

Hironobu Niijima

Hiroshi Kawamoto

The object of the invention is to provide an IC analysis system having a charged particle beam apparatus in which the operability and picture quality have been enhanced and the measurement method of a device under test. In the IC analysis system, stop signal generating means in which the stop signal stimulates the acquisition of image data is added to a test pattern generator and acquisition completion signal generating means which releases the stopping state on completing the acquisition of image data and which resumes the test pattern updating operation is added to the charged particle beam apparatus. Furthermore, by adding mode select means to the charged particle beam apparatus, a clearer potential contrast image can be obtained. The methods for locating fault positions can be realized in the IC analysis system having the charged particle beam apparatus wherein the image data can be obtained by alternate test patterns, or by adding one image data to the reverse potential of another image data, or by scanning and irradiating the charged particle beam onto the same surface of the device at a plurality of times.

IC analysis system having charged particle beam apparatus for improved

An IC fault analysis system which is capable of accurately correlating mask layout data and/or net listing data associated with CAD (computer aided design) data developed in the IC design and an image obtained by a non-contact type tester such as an electron beam tester. The IC fault analysis system includes a circuit diagram display for showing a circuit diagram of the IC device under test based on the CAD data, a mask layout display for showing a mask layout of the IC device under test based on the CAD data, a contrast image display for showing a potential distribution of the IC device under test obtained in the non-contact type tester, an input means connected to the circuit diagram display for specifying a circuit component of the IC device under test, a comparison means for comparing the circuit diagram of the circuit component defined by the input means and contrast image corresponding to the circuit component, and a comparison data memory for storing the comparison data of the comparison means and providing the comparison data to the contrast image display.

IC fault analysis system having charged particle beam tester

A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

IC analysis system and electron beam probe system and fault isolation

An IC test system analyzes a defective part in the inside of an IC chip. The IC test system irradiates an ion beam on the surface of the IC under test and displays a potential contrast image of wiring conductors under the surface of the IC device. The IC test system has improved operability and image quality as well as a capability of specifying a defective part of the IC under test. A stop pattern setting part is provided for setting a plurality of patterns to suspend a renewal operation of pattern generation in a test pattern generator. Whenever this stop pattern occurs, a pattern renewal action of the test pattern generator is stopped and repeatedly generates the stop pattern while an ion beam tester acquires image data. When the acquisition of the image data completes, the test pattern generator resumes the pattern renewal action. Different test patterns are alternatively applied to the IC under test and the resulting image data is either added or subtracted to improve an image quality. By further controlling on and off of a power source to the IC under test, the potential contrast image can be obtained with further certainty.

IC tester joined with ion beam tester and the detection method of the

A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patters set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

IC Analysis system and electron beam probe system and fault isolation

A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pa-tern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

Growing community of inventors

Kazo, Japan

Akira Goishi