Shin-etsu Quartz Products Co., Ltd.

Other

Heraeus Quarzglas Gmbh & Co Kg

Shin-etsu Handotai Co., Ltd.

Heraeus Quarzglas Gmbh

Haraeus Quarzglas Gmbh

Shin-etsu Chemical Co., Ltd.

Shin-etsu Quartz Products Ltd.

Opto-electronics Laboratory, Inc.

Akira Fujinoki

Hiroyuki Nishimura

Tatsuhiro Sato

Kyoichi Inaki

Nobumasa Yoshida

Tetsuji Ueda

Akihiko Sugama

Hisatoshi Otsuka

Wolfgang Englisch

Toshiyuki Kato

Masaatsu Kataoka

Toshikatsu Matsuya

Tohru Yokota

Takayuki Oshima

Toru Yokota

Yasuyuki Yaginuma

Atsushi Iwasaki

Akira Sato

Kazuo Shirota

Yasuhiko Sato

Nobuyoshi Ogino

Hiroshi Matsui

Masaaki Aoyama

Mitsuo Matsumura

Atsushi Shimada

Eiichi Shinomiya

Akira Uchikawa

Toshio Fukuoka

Tomoyuki Shirai

Martin Trommer

Kazuhisa Hayakawa

Stefan Ochs

Hiroyuki Watanabe

Shingo Niinobe

Tohru Segawa

Yuya Yokosawa

Tatsuya Mori

Takayuki Imaizumi

Kunio Yoshida

Tsukasa Sakaguchi

Masahiro Nakatsuka

Hidetsugu Yoshida

Toshiki Mori

Takahiro Kaitou

Michinari Ohuchi

Takayuki Shimakawa

Itsuo Araki

Kazuhisa Shin-Etsu Chemical Co Ltd Hayakawa

Shingo Shin-Etsu Chemical Co Ltd Niinobe

Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.

Silica glass member for hermetic sealing of ultraviolet SMD LED element and method for manufacturing quartz glass member for ultraviolet led

It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same

Disclosed is a printed wiring board which attains aims of printed wiring boards required for realizing high-speed, high-frequency semiconductor devices, namely a printed wiring board having low dielectric constant, low dielectric loss tangent and low linear expansion coefficient. Also disclosed is a composite woven fabric suitably used as a base material for such a printed wiring board. Specifically disclosed is a composite woven fabric containing quartz glass fibers and polyolefin fibers, in which the ratio of the quartz glass fibers to the composite woven fabric is set at 10 vol % or more and 90 vol % or less. It is preferred that the quartz glass fibers each have a filament diameter of 3 &#x3bc;m or more and 16 &#x3bc;m or less, and the composite woven fabric has a thickness of 200 &#x3bc;m or less.

Composite woven fabric and printed wiring board

First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cmor more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

Production process of synthetic quartz glass

A process for producing a transparent or opaque silica glass product including mixing a silica fine powder and a cellulose derivative and injection molding the mixture, followed by degreasing treatment and baking treatment, which is characterized in that the cellulose derivative is a cellulose derivative which causes reversible thermal gelation in an aqueous solution of at least one member selected from methyl cellulose, hydroxypropylmethyl cellulose and hydroxyethylmethyl cellulose; in producing a transparent silica glass product, the cellulose derivative is added in water heated at a gelation temperature thereof or higher, and after cooling, the formed aqueous solution is kneaded with the silica fine powder; and in producing an opaque silica glass product, the cellulose derivative is added in a silica slurry containing a silica powder and heated at a gelation temperature of the cellulose derivative or higher.

Process for producing silica glass product

An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mmper 100 cm.

Quartz glass body having improved resistance against plasma corrosion, and method for production thereof

The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cmor less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1&#xd7;10to 10&#xd7;10molecules/cmand, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Optical synthetic quartz glass and method for producing the same

It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm(energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of &#x2267;1 to &#x2266;300 ppm; contained hydrogen molecule concentration is in the range of &#x2267;2&#xd7;10to &#x2266;2&#xd7;10molecules/cm; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of &#x2267;880 to &#x2266;990&#xb0; C.

Synthetic quartz glass optical material for YAG laser with higher harmonic

An object is to provide a method for producing an optical synthetic quartz glass and an optical synthetic glass, having a birefringence of lower than 0.5 nm/cm and having favorable refractive index distribution, yet without lowering the productivity, as well as to provide an annealing furnace suitably used in practicing said method. In a step of raising the temperature of a columnar optical synthetic quartz glass preform to a temperature of from 800&#xb0; C. to 1200&#xb0; C., and after keeping for a definite time, lowering the temperature, the temperature is lowered with a temperature difference of from 1 to 20&#xb0; C. between the temperature of the light transmitting surface of the optical synthetic quartz glass preform and the temperature of the outer peripheral side surface of the optical synthetic quartz glass preform at temperature-lowering rates of from 2 to 50&#xb0; C./hour, respectively.

Production method of optical synthetic quartz glass, optical synthetic quartz glass, and annealing furnace

An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use. The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiOpowder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.

Method for heat treating synthetic quartz glass for optical use

An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

Method of producing an optical member

In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity. The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers, which, in a method for producing a synthetic quartz glass member for excimer laser optics comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600&deg; C. or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.

Method for producing synthetic quartz glass members for excimer lasers

A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950&deg; C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1&times;10 . The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.

Synthetic quartz glass blank

An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F excimer laser and a high resistance against irradiation of a F excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5&times;10 molecules/cm or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2&times;10 or lower.

Synthetic quartz glass optical material and optical member

Growing community of inventors

Koriyama, Japan

Akira Fujinoki