Hitachi, Ltd.

Nissan Motor Company Limited

Komatsu Corporation

Sony Corporation

Brother Kogyo Kabushiki-kaisha

Fuji Photo Film Company, Limited

National Institute of Advanced Industrial Science and Technology

Other

Kabushiki Kaisha Toshiba

Mitsubishi Denki Kabushiki Kaisha

Cypress Semiconductor Corporation

Toyoda Gosei Co., Ltd.

Sony Semiconductor Solutions Corporation

Asahi Kasei Kogyo Kabushiki Kaisha

Sumitomo Heavy Industries, Ltd.

Akira Endo

Osamu Wakabayashi

Kazuhiko Kajigaya

Masashi Horiguchi

Ryoichi Hori

Takashi Yamazaki

Kazuyoshi Oshima

Kazuyuki Miyazawa

Jun Etoh

Yuji Sakai

Hiroshi Yoshioka

Yasunori Yamaguchi

Tetsurou Matsumoto

Makoto Morino

Yasuhiro Kasama

Shinichi Ikenaga

Shinji Udo

Eiji Miyamoto

Mitsuhiro Takano

Sinichi Miyatake

Manabu Tsunozaki

Jiro Sawada

Hirokazu Saito

Atsushi Kumata

Hideo Hoshino

Yoshifumi Ueno

Tamotsu Abe

Shinji Nagai

Kouji Kakizaki

Kenji Sekine

Tatsuya Yanagida

Akira Sumitani

Takashi Suganuma

Hiroshi Komori

Masato Moriya

Takanori Shibata

Akira Terahara

Georg Soumagne

Hisao Katto

June Sugiura

Tatsuya Ariga

Krzysztof Nowak

Yoichi Kaneko

Hideo Ohira

Takeshi Asayama

Jiro Takezaki

Yukitsugu Hirota

Masaki Nakano

Hakaru Mizoguchi

Tsukasa Hori

Takashi Arai

Masao Kuroda

Akira Shimamura

Mitsuru Ohta

Yoshio Tsujita

Seiji Kobayashi

Masanori Sato

Nabil Sven Loghin

Isao Suzuki

Ryoji Ikegaya

Kenichi Murata

Masahiko Ibamoto

Kazuma Goto

Nobuo Kurihara

Takao Sasayama

Daisuke Kawakami

Tomiya Abe

Hiroshi Aoki

Tadashi Fukami

Shuji Eguchi

Tsutomu Inoue

Hiroyuki Kamata

Takashi Inaba

Haruo Miura

Toshihiro Fujiki

Minoru Fukuda

Shigeyuki Suzuki

Takayuki Ishii

Tomoya Ogawa

Yasushi Masuda

Takanobu Ishihara

Masashi Tsuda

Atsushi Kanke

Shigeru Oho

Isamu Nakao

Seikichi Tanno

Mamoru Sugimoto

Hiroyuki Mita

Minoru Osuga

Takenobu Nakamura

Naohiko Takahashi

Hiroshi Nakazawa

Eiichi Hase

Akira Hasegawa

Hideki Asano

Yuji Matsuzaki

Noritoshi Kitano

Masaaki Numata

Hirokazu Tanaka

Kotaro Nishimura

LDPC coding is executed using a check matrix of an LDPC code whose code length is 736 bits and whose code rate is 1/4, and modulation is executed using a repetition unit that has an LDPC code obtained by the LDPC coding, repeatedly arranged therein. The LDPC code includes information bits and parity bits, the check matrix includes an information matrix portion corresponding to the information bits and a parity matrix portion corresponding to the parity bits, the parity matrix portion has a stepwise structure, the information matrix portion is indicated by a check matrix initial value table, and the check matrix initial value table is a predetermined table indicating positions of elements of '1' of the information matrix portion for each eight columns. This technique is applicable to, for example, information transmission using the LDPC code.

Transmitting apparatus and transmission method, receiving apparatus and reception method, and program

The turbo machine includes a rotorwith a rotating shaft, a statorenclosing the rotorand a sealing deviceinstalled in a clearance passage defined between the rotorand the stator, the sealing devicecontrolling a leakage flow from the clearance passage B. The sealing deviceincludes a plurality of sealing finsdisposed on at least one of the rotorand the stator, and arranged in an axial direction of the rotor. The sealing devicefurther includes at least one deceleration controlling memberprovided on the rotational side. The deceleration controlling memberprojects toward a chamberdefined between the sealing finsand is configured to control a reduction in the velocity of the leakage flow B in the chamberin the rotational direction of the rotor

Sealing device and turbo machine

A far-side airbag apparatus includes: an airbag which is fixed via a fixed portion set in a rear end portion of the airbag, and protects an upper body of an occupant, who sits on a vehicle seat positioned apart from a side wall portion of a vehicle in which multiple vehicle seats are provided side by side in a width direction, by deploying and inflating the airbag diagonally forward and upward from the fixed portion between adjacent vehicle seats via inflating gas which is supplied from a gas generator according to a side impact applied to the side wall portion of the vehicle, wherein a rear lower portion of the airbag is formed as a support portion that has a high rigidity and supports an upper portion positioned higher than the rear lower portion of the airbag.

Far-side airbag apparatus

Provided is a rotating fluid machine capable of holding down a decrease rate of a circumferential velocity of a leakage fluid in an interspatial flow passage and thereby controlling an unstable fluid force. A steam turbine includes: an interspatial flow passageformed between an outer circumferential surface of a rotor blade coverand an inner circumferential surface of a grooved sectionin a casing; annular sealing finsA toD spatially arranged in a direction of a rotor axis, at a side of the rotor blade coverin the interspatial flow passage; and a friction enhancement portion (more specifically, rough surfacesA toE) disposed over the whole circumference on the side of the rotor blade coverin the interspatial flow passage

Rotating fluid machine

An adsorption characteristic measuring apparatus is configured to: acquire a unit-time leak pressure value from a pressure increase value of an internal pressure value of a sample tube caused by an non-adsorption gas leaking from the outside of a fitting portion into an inner space of the sample tube; acquire a pressure value at which a temporal change of the internal pressure value of the sample tube assumes an equilibrium state when an adsorption gas present in the reference volume portion is supplied into the sample tube and the sample tube is in a closed state; calculate a pressure value after correction of a real leak pressure value is performed on a measured equilibrium pressure value, as a true equilibrium pressure value, the real leak pressure value being obtained in such a manner that the unit-time leak pressure value is multiplied by a leak time; and calculate an adsorption isotherm.

Adsorption characteristic measuring apparatus

A signal processor includes a period detection section which detects that a period is currently used for communication of a frame; a pattern detection section which detects, from the received signal, a first signal pattern by which the end of communication of the frame is recognized; and an output processing section which outputs the received signal to a controller; configured to instruct, upon detection of the first signal pattern in the period being currently used for communication of a frame, the controller to halt startup of communication action of the next frame, until the period being currently used for communication of a frame comes to the end, to thereby reduce an event such that frames are transmitted from a plurality of communication devices simultaneously, and to thereby allow the communication action for the next frame to proceed correctly.

Signal processor and communication device

A measurement apparatus according to the present disclosure including a plurality of transparent electrodes provided on a surface of a display, an acquisition part acquiring an imaging signal obtained by imaging the surface of the display from an inside of the display, a configuring part configuring electrode pair candidates from the plurality of transparent electrodes based on the imaging signal acquired in a state that a subject touches the surface of the display, an electrocardiographic waveform signal measurement part measuring electrocardiographic waveform signals of the subject using respective electrode pair candidates configured, and a determination part determining a measurement electrode pair from the electrode pair candidates based on the electrocardiographic waveform signals measured using respective electrode pair candidates. This measurement apparatus is applicable to, for example, performing a personal authentication process of the subject based on the electrocardiographic waveform signal.

Measurement apparatus, measurement method, program and information processing apparatus

In a centrifugal compressor, for the purpose of preventing the positions of a diaphragm and a head flange in a radial direction from moving with respect to a casing, preventing the unstable vibration of the rotor and enabling an efficient and stable operation even on high-pressure conditions, there is provided a barrel-shaped centrifugal compressor including a casing, a diaphragm located in the casing to define a flow channel, and a head flange attached to the end of the casing by a shear key, wherein in the inner peripheral surface of the casing and the outer peripheral surface of abutment portions of the diaphragm and the head flange in which they are abutted on the inner peripheral surface of the casing, sliding key grooves which are vertical to the surfaces are provided at least two portions in a peripheral direction, and sliding keys are provided in the key grooves.

Barrel-shaped centrifugal compressor

An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

Extreme ultraviolet light source apparatus

Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation devicethat outputs target material dropletstowards a predetermined plasma emission point; a charging devicethat charges the target material droplets; a trajectory correction devicethat generates a force field in the trajectory to correct the travel direction of the charged target material dropletsso that the charged target material dropletstravel towards the plasma emission point; and a laser light sourcethat irradiates, at the plasma emission point, a laser beam onto the charged target material to generate plasma thereby.

Extreme ultraviolet light source device

Hexafluoroacetone or a hydrate thereof is produced with a high yield by subjecting a 1-fluoro-4,4-bis(trifluoromethyl)-2,3,5-trioxolanyl ether compound represented by the general formula: wherein R is an alkyl group having 1 to 8 carbon atoms, an aryl group, or a benzyl group, which has been obtained by ozone oxidation of a heptafluoroisobutenyl ether compound, to a reduction reaction in the presence of a reducing agent selected from dialkyl sulfide containing an alkyl group having 3 or 4 carbon atoms, diaryl sulfide, diaryl disulfide, and diaralkyl sulfide.

Method for producing hexafluoroacetone or hydrate thereof

An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

Laser apparatus and extreme ultraviolet light source apparatus

An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Extreme ultraviolet light source device and method for generating extreme ultraviolet light

An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Extreme ultra violet light source apparatus

An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

Extreme ultraviolet light source apparatus and method of generating ultraviolet light

Growing community of inventors

Tokyo, Japan

Akira Endo