Fujitsu Corporation

Akira Abiru

Masahiro Sugimoto

Juro Inomata

Akira Machida

A compact wafer carrier for storing spaced semiconductor wafers in parallel with each other, is provided for fabrication processes of a semiconductor device requiring a high particulate contamination control. The wafer carrier has an air cleaning device, including a secondary battery as a power source, a motor fan, and a particulate air filter, and a storing chamber directly connected to the air cleaning device for storing the wafers. The storing chamber has a first opening for receiving the filtered air flow, and a second opening for loading and unloading the wafers, both openings facing each other. As a result, the major part of the filtered air flows in a laminated stream passing along the surfaces of the wafers stored with a fairy high speed, serving to protect the wafers from the intrusion of the particles contained in the environmental air, and removing the particles originally adhered to the surfaces of the wafers.

Wafer carrier for a semiconductor device fabrication, having means for

A semiconductor device having a protective polyimide film layer for preventing .alpha.-rays from intruding into the device is provided. The polyimide film layer has incorporated therein a salient amount of finely divided filler particles, and is formed on the surface of at least a region wherein the semiconductor element is formed. The polyimide film layer is formed by coating the semiconductor substrate with a liquid polyimide or polyamic acid composition having incorporated therein the finely divided filler particles, according to a screen printing method.

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Yokohama, Japan

Akira Abiru