Fujitsu Corporation

Adv Antest Corporation

Nec Corporation

Ddk Ltd.

Morinaga Milk Industry Co., Ltd.

Other

Daiichi Denshi Kogyo Kabushiki Kaisha

Intel Corporation

Fujitsu Vlsi Limited

Ishikawajima-harima Heavy Industries Co., Ltd.

Bunker Ramo Corporation

Hospal Ag

Yabe, Takayuki

Akio Yamada

Hiroshi Yasuda

Kiichi Sakamoto

Yoshihisa Oae

Yasushi Takahashi

Tomohiko Abe

Masaki Kurokawa

Junichi Kai

Takamasa Satoh

Kota Iwamoto

Satoru Yamazaki

Toshiyuki Nomura

Kenichi Miyazawa

Ryota Mase

Soichiro Arai

Kazuyuki Ozai

Kenichi Kawakami

Hidefumi Yabara

Isao Kojima

Hirokazu Takahashi

Katsuhiko Kobayashi

Hitoshi Watanabe

Yoshihisa Ooaeh

Hitoshi Tanaka

Masahiro Takizawa

Kazuhiro Sato

Hitoshi Kikuchi

Eiji Kasutani

Yoshiaki Igarashi

Jun Matsumoto

Shinichi Kojima

Atsushi Saito

Shinichi Hamaguchi

Koichi Hashimoto

Yoshihisa Ooae

Shigeki Nishina

Shunsuke Fueki

Hiroshi Miyakawa

Hitoshi Saito

Shoji Kojima

Koichi Yamashita

Yukio Saito

Naoki Nishio

Shinji Sugatani

Hisayasu Nishino

Takashi Kiuchi

Masahiro Seyama

Manabu Ohno

Isamu Seto

Masami Takigawa

Shinya Ishizuka

Jinko Kudou

Kouzi Takahata

Takayuki Yabe

Satoru Sagou

Hiromichi Kato

Kenichi Kawashima

Nobuyuki Yasutake

Mitsuhiro Nakano

Tatsuro Ohkawa

Yasuyuki Koguchi

Yukio Saitoh

Takuma Sakurai

Keiji Yamada

Toru Oshima

Kenj Kudoh

Tatsuro Okawa

Minoru Soma

Hirokazu Hamano

Shigehiro Mori

Hisako Moriuchi

Fumio Furuya

Yoshitaka Tamura

Masumi Ishikawa

Takamasa Sato

Hirotoshi Hayasawa

Hiroshi Ochi

Toshio Takeuchi

Katsuhiro Sasaki

Takuya Higeta

Tsutomu Kudo

Tomonari Otsuki

Kazushi Ishida

Hiromasa Inouye

Yuji Mishima

Tetsuya Kuhara

Tomohiro Sakazaki

Mai Murata

Yasushi Kawaguchi

Junichi Minami

Takehito Itoh

Hideki Nasuno

Daisuke Ochi

Shigenobu Aihara

Tohru Ikeda

Shuzo Ishida

Fumio Hayashi

Junko Hatta

Provided is a novel sleep-promoting composition. Provided is a sleep-promoting composition comprising bacteria belonging toas an active ingredient. The sleep-promoting composition related to the present technology may prolong a sleep time by prolonging non-REM sleep and REM sleep, reducing a spontaneous behavior amount during sleep, or reducing an awakening time during sleep. The sleep-promoting composition related to the present technology may also reduce difficulty in daytime awakening. The sleep-promoting composition related to the present technology may be used for a medical composition or a food and beverage composition.

Sleep-promoting composition, and medical composition and food beverage composition using said sleep-promoting composition

Provided is a three-dimensional laminating and shaping apparatusincluding a column unitthat is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer, an insulating portion that electrically insulates a three-dimensional structurefrom a ground potential member, an ammeterthat is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure, a melting judging unitthat is configured to detect that the powder layeris melted based on the current value measured by the ammeterand generate a melting signal, and a deflection controllerthat is configured to receive the melting signal to determine the condition for the irradiation with the electron beam.

Three-dimensional laminating and shaping apparatus and laminating and shaping method

Provided is a three-dimensional laminating and shaping apparatusincluding a column unitthat is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer, an electron detectorthat is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layerwhen the powder layeris irradiated with the electron beam EB, a melting judging unitthat is configured to generate a melting signal based on the strength of the detection signal from the electron detector, and a deflection controllerthat is configured to receive the melting signal to determine the condition of the irradiation the electron beam.

To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

Device, manufacturing method, and exposure apparatus

To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Exposure apparatus and exposure method

Advertisement information relating to an object is provided in real time, while capturing images of the object. m first local features which are respectively feature vectors from one dimension to i dimensions are stored in association with an object, n feature points are extracted from a video picture, n second local features which are respectively feature vectors from one dimension to j dimensions are generated, the smaller number of dimensions is selected, of the number of dimensions i and the number of dimensions j, and an object is recognized to be present in the video picture and advertisement information relating to that object is provided when determination is made that at least a prescribed ratio of the m first local features of the selected number of dimensions corresponds to the n second local features of the selected number of dimensions.

Information processing system, information processing method, communications terminals and control method and control program thereof

A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

Multicolumn charged particle beam exposure apparatus

Provided is an exposure apparatus that exposes a pattern on a sample, the exposure apparatus including a plurality of blanking electrodes that are provided corresponding to a plurality of charged particle beams and each switch whether the corresponding particle beam irradiates the sample according to an input voltage; an irradiation control section that outputs switching signals for switching blanking voltages supplied respectively to the blanking electrodes; and a measuring section that, for each blanking electrode, measures a delay amount that is from when the switching signal changes to when the blanking voltage changes.

Complex and fine patterns may be formed by an exposure apparatus that decreases movement error of a stage including a beam generating section that generates a charged particle beam, a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section, a detecting section that detects a position of the stage section, a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section, and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount.

The invention relates to a charged particle beam exposure apparatus configured to expose cut patterns or via patterns on a substrate having a plurality of line patternsarranged on an upper surface of the substrate at a constant pitch by irradiating the substrate with a plurality of charged particle beams Bto Bn while moving a one-dimensional array beam Ain an X direction parallel to the line patterns, the one-dimensional array beam Abeing a beam in which the charged particle beams Bto Bn are arranged in an Y direction orthogonal to the line patterns

Charged particle beam exposure apparatus and method of manufacturing semiconductor device

The invention provides an exposure apparatus () including a formation module () which forms charged particle beams with different irradiation positions on a specimen. The formation module () includes: a particle source () which emits the charged particle beams from an emission region () in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device () provided with openings () arranged in an illuminated region () in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses () provided between the particle source () and the aperture array device (); and a beam cross-section deformation device () which is provided between the particle source () and the aperture array device (), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

Exposure apparatus

A search object and m-number of first local features respectively constituted by a feature vector of 1 to i dimensions of local areas of m-number of feature points in an image of the search object are stored, feature points are extracted from the image, second local features respectively constituted by a feature vector of 1 dimension to j dimensions are generated with respect to local areas of n-number of feature points, a smaller number of dimensions among the number of dimensions i of the first local features and the number of dimensions j of the second local features is selected, and an existence of the search object in the image in the video is recognized when a prescribed ratio of the m-number of first local features up to the selected number of dimensions corresponds to the n-number of second local features up to the selected number of dimensions.

Information processing system, information processing method, information processing apparatus and control method and control program thereof, and communication terminal and control method and control program thereof

Merchandise management is implemented by recognizing a piece of merchandise in an image on a video in real time. A piece of merchandise and m-number of first local feature which are respectively 1-dimensional to i-dimensional feature vectors are stored after being associated with each other, n-number of feature points are extracted from an image on a video captured by an imaging unit, n-number of second local feature which are respectively 1-dimensional to j-dimensional feature vectors are generated, a smaller number of dimensions of the number of dimensions i and the number of dimensions j is selected, and a recognition that the merchandise exists in the image on the video is made when it is determined that a prescribed proportion or more of the m-number of first local feature of the selected number of dimensions correspond to the n-number of second local feature of the selected number of dimensions.

Information processing system, information processing method, information processing device and control method and control program thereof, and communication terminal and control method and control program thereof

An exposure apparatus is configured to include an electronic optical systemthat generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detectorand a fog preventing mechanismthat are placed between the electronic optical systemand the wafer stage WS. A substrateconstitutes the fog preventing mechanism, and opening holesthat penetrate up to the upper surface of the substrateare formed in a first area of the bottom surface of the substrate, and opening holesthat are closed in the substrateare formed in a second area of the bottom surface.

Growing community of inventors

Tokyo, Japan

Akio Yamada