Hitachi, Ltd.

Hitachi Microcomputer System, Ltd.

Akio Saito

Katsuhiro Ota

Haruo Itoh

Hitoshi Oka

Yoichi Takahara

Katsuhiko Itoh

Takao Satoh

Sukeyoshi Tsunekawa

Michimasa Funabashi

Yuzo Hiroshige

Maki Shimoda

Kazuhiko Kawai

Yasuhiro Hamatsuka

Koutarou Koizumi

A product design support method and system are disclosed in which assuming that a globally distributed commodity is disposed of as a waste product by different recycle methods in different regions or countries, the recycle cost and environmental load accrued by different processing methods are quantified using the product design information thereby to assist in the design improvement. The product information and the regional recycle characteristics are input to determine the recycle method by region. Further, the recycle cost/environmental load by region are quantified based on the product design information using the basic unit information of the recycle cost and environmental load by region.

Product design support method and system

A polishing slurry prepared by dispersing in a dispersion medium, abrasive grains comprised of a material having a solubility in the dispersion medium at 25&deg; C., of 0.001 g/100 g or higher is used to effectively remove any abrasive grains standing adherent to the surfaces of objects to be polished or the interiors of polishing apparatus after polishing.

Polishing slurry

Method for polishing a semiconductor substrate member

Process for fabricating a semiconductor device

By employing a cleaning method wherein a substrate such as Si wafer is covered with a film having electrostatic repulsive force or a substance capable of controlling a zeta potential so as to prevent or remarkably reduce adhesion of fine particles present in a cleaning solution or etching solution, electronic parts can be produced in higher yield and lower cost.

Semiconductor cleaning and production methods using a film repulsing

A highly clean fluid treatment system having a small system volume is provided by using a Bernoulli holder to accomplish stable holding of a specimen in a simple configuration. A holder having a specimen hold face formed almost the same as a specimen or having a Bernoulli effect producing region and a region surrounding the Bernoulli region made of a specific combination of materials is used and fluid supply sources are connected to the holder for supplying one or more fluids containing a treatment agent of a specimen. Since a force for inhibiting a position shift occurs on the end face of the specimen 10, stable specimen holding is enabled. The space between the specimen and the holder where treatment is executed is narrow and fluid always flows from the treatment space to the outside. Therefore, the fluid treatment system of a small volume producing high treatment efficiency and minimizing the chances of recontamination of the specimen can be provided.

Specimen holding method and fluid treatment method of specimen surface

According to the present invention, the surface of the sample is cleaned with water immediately after ashing of the resist the quality of which has been changed through ion implantation by ozone-containing gas, or ozone-containing gas and ultraviolet ray, or the sample is cleaned with water without being exposed to the atmosphere after ashing, thereby allowing the number of residues to be reduced to 1/100, decreasing the load in cleaning process by solution, cutting down the semiconductor device production cost and improving the semiconductor device productivity.

Removal method of organic matter and system for the same

A method of controlling the adhesion of fine particles to an object in a solution characterized in that the adhesion of fine particles in the solution is prevented or reduced by adding into the solution a material, which is capable of controlling the zeta potential (surface potential) of the fine particles, in the amount of 10.sup.-7 to 25% by volume.

Method of controlling adhesion of fine particles to an object in liquid

Growing community of inventors

Fujisawa, Japan

Akio Saito