Mitsui Chemicals, Inc.

Mitsui Toatsu Chemicals, Incorporated

Akio Kikkawa

Isao Harada

Hiromi Hayashida

Tatsuma Morokuma

Naruyuki Iwanaga

Toshihiko Nishitsuji

Yukihiro Yoda

Shigeo Kanayama

A metal container to be filled with a halogen containing gas, with the inner surface processed with a polishing agent. The gas has a reduced purity decline by the increase of the water content or impurities from the inner surface of the container which is absorbed by the gas over the passage of time. The inner surface processing method is improved such that the value of dividing the area of the Si2s peak by the area of the Fe2ppeak in the X-ray photoelectron spectrum of the gas container inner surface with the inner surface process with a polishing agent applied is 0.3 or less.

Processing method for high pressure gas container and halogen containing gas filled in said container

An electrode for electrolyzing an electrolyte comprising an ammonium fluoride (NH F)-hydrogen fluoride (HF)-containing molten salt and having a composition ratio (HF/NH F) of 1 to 3 to prepare a nitrogen trifluoride (NF ) gas and an electrolyte for use in the preparation of NF gas, and a preparation method of the NF gas by the use of the electrode and the electrolyte. The electrode comprises nickel having 0.07 wt % or less of Si content and containing a transition metal other than nickel. The electrolyte also contains a transition metal other than nickel.

Electrode and electrolyte for use in preparation of nitrogen trifluoride gas, and preparation method of nitrogen trifluoride gas by use of them

A process for producing high-purity nitrogen trifluoride gas by molten salt electrolysis using a nickel electrode and ammonium hydrogenfluoride as an electrolyte, wherein carbon element constituting impurity gases entrained in a crude gas, among impurities in the nickel electrode as an anode is controlled to an amount of 400 wt ppm or less. The process allows high-purity nitrogen trifluoride gas to be produced with a purity of 4N or higher.

Process for producing high-purity nitrogen trifluoride gas

The method for preparing a gaseous metallic floride is here disclosed which comprises reacting a metal or its oxide with a fluorine gas or nitrogen trifluoride gas, the aforesaid method being characterized by comprising the steps of mixing the metal or its oxide with a molding auxiliary comprising a solid metallic fluoride which does not react with fluorine and nitrogen trifluoride; molding the resulting mixture under pressure; and contacting the molded pieces with the fluorine gas or nitrogen trifluoride gas, while the molded pieces are heated.

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Yamaguchi, Japan

Akio Kikkawa